粉末冶金材料科学与工程
粉末冶金材料科學與工程
분말야금재료과학여공정
POWDER METALLURGY MATERIALS SCIENCE AND ENGINEERING
2014年
5期
832-838
,共7页
多层膜%微观结构%磁电阻%电子束蒸镀
多層膜%微觀結構%磁電阻%電子束蒸鍍
다층막%미관결구%자전조%전자속증도
multimembranes%microstructure%magneto-resistor%electron beam vapor deposition
采用电子束蒸发法制备具有不同Co层厚度的Co/Ru多层膜。采用X射线衍射(XRD)、高分辨透射电镜(HRTEM)、扫描电镜(TEM)等对多层膜的微观结构进行观察与分析，研究多层膜微观结构对多层膜磁阻性能的影响，并探讨多层膜磁阻的产生机理。结果表明：Co层的厚度tCo对于薄膜的微观结构和磁阻性能有很大影响，当tCo≥0.8 nm时Co/Ru多层膜以层状方式连续生长，且tCo越大，薄膜结晶越完整，薄膜呈现负磁阻效应；当tCo=0.5 nm时，Co/Ru多层膜为岛状生长，Co/Ru界面的不对称性使得薄膜出现正磁阻效应。
採用電子束蒸髮法製備具有不同Co層厚度的Co/Ru多層膜。採用X射線衍射(XRD)、高分辨透射電鏡(HRTEM)、掃描電鏡(TEM)等對多層膜的微觀結構進行觀察與分析，研究多層膜微觀結構對多層膜磁阻性能的影響，併探討多層膜磁阻的產生機理。結果錶明：Co層的厚度tCo對于薄膜的微觀結構和磁阻性能有很大影響，噹tCo≥0.8 nm時Co/Ru多層膜以層狀方式連續生長，且tCo越大，薄膜結晶越完整，薄膜呈現負磁阻效應；噹tCo=0.5 nm時，Co/Ru多層膜為島狀生長，Co/Ru界麵的不對稱性使得薄膜齣現正磁阻效應。
채용전자속증발법제비구유불동Co층후도적Co/Ru다층막。채용X사선연사(XRD)、고분변투사전경(HRTEM)、소묘전경(TEM)등대다층막적미관결구진행관찰여분석，연구다층막미관결구대다층막자조성능적영향，병탐토다층막자조적산생궤리。결과표명：Co층적후도tCo대우박막적미관결구화자조성능유흔대영향，당tCo≥0.8 nm시Co/Ru다층막이층상방식련속생장，차tCo월대，박막결정월완정，박막정현부자조효응；당tCo=0.5 nm시，Co/Ru다층막위도상생장，Co/Ru계면적불대칭성사득박막출현정자조효응。
The Co/Ru multimembranes with different thickness of Co layer were prepared by electron beam vapor deposition. XRD, HRTEM and TEM were employed to investigate the microstructure of the multimembranes. The effect of microstructure on magnetic properties and the magneto-resistor origin mechanism of Co/Ru multimembranes were discussed. The results show that the thickness of Co layer has great effect on the microstructure and magneto-resisitor properties of the multimembranes. When the thickness of Co layer is more than 0.8 nm, the growth of multimembranes follows Frank-van der Merwe mode while the crystallinity is better with the thickness of the Co layer increase, and the multimembranes show negative magneto-resistance effect;when the thickness of Co layer is less than 0.5 nm, the growth of multimembranes follows Volmer-Weber mode and the multimembranes show positive magneto-resistance effect due to the asymmetry interface.
