CAJ | 학술논문

采用离子束溅射技术，在熔融石英基底上制备了SiO2薄膜，并通过椭偏光谱法和表面热透镜技术研究了热处理对其光学特性的影响。热处理对离子束溅射SiO2薄膜折射率影响较大，随着热处理温度增加，SiO2薄膜折射率先减小后增大，当热处理温度为550℃时，折射率达到最小。经过热处理后，SiO2薄膜的弱吸收均得到了降低，在2 ppm(1 ppm=10-6)左右，当热处理温度为550℃时，获得的SiO2薄膜弱吸收最小仅为1.1 ppm。实验结果表明：采用合适的热处理温度，能大大改善离子束溅射SiO2薄膜的折射率和吸收特性。
채용리자속천사기술，재용융석영기저상제비료SiO2박막，병통과타편광보법화표면열투경기술연구료열처리대기광학특성적영향。열처리대리자속천사SiO2박막절사솔영향교대，수착열처리온도증가，SiO2박막절사솔선감소후증대，당열처리온도위550℃시，절사솔체도최소。경과열처리후，SiO2박막적약흡수균득도료강저，재2 ppm(1 ppm=10-6)좌우，당열처리온도위550℃시，획득적SiO2박막약흡수최소부위1.1 ppm。실험결과표명：채용합괄적열처리온도，능대대개선리자속천사SiO2박막적절사솔화흡수특성。
SiO2 films were deposited on fused silica sub strates by ion beam sputtering technology and the effects of thermal treatment on optical properties were studied by ellipsometry technology and surface thermal lens technology. The effects of thermal treatment temperature on refractive index of IBS-SiO2 films were very large, as the increase of thermal treatment temperature, refractive index of SiO2 films first decrease and then increased, when the thermal treatment temperature was 550℃, the refractive index was the minimum. After thermal treatment, the weak absorption of SiO2 films were all reduced, the value of weak absorption was about 2 ppm. When the thermal treatment temperature was 550℃, the least weak absorption of 1.1 ppm was obtained. The results show that refractive index and absorption properties of IBS-SiO2 films can be largest improved by the proper thermal treatment temperature.