发光学报
髮光學報
발광학보
CHINESE JOURNAL OF LUMINESCENCE
2014年
12期
1427-1431
,共5页
多孔硅%铁钝化%光致发光%非桥氧空穴%水热腐蚀
多孔硅%鐵鈍化%光緻髮光%非橋氧空穴%水熱腐蝕
다공규%철둔화%광치발광%비교양공혈%수열부식
porous silicon%iron passivated%photoluminescence%non-bridging oxygen hole%hydrothermal etching
采用水热腐蚀法制备了铁钝化多孔硅样品,样品光致发光谱的荧光峰位于2.0 eV附近,半峰宽约为0.40 eV。激发波长从240 nm增大到440 nm的过程中,荧光峰先红移再蓝移,最后基本稳定,变化曲线呈勺型。通过分析15片发光多孔硅样品的统计结果,发现荧光峰逆转所对应的激发波长位于330 nm附近,相应的激发光子能量约为3.8 eV。样品光致发光谱随激发波长的勺型变化过程与≡Si—O↑和≡Si—O↑…H—O—Si≡两类非桥氧空穴发光中心共同作用时的发光行为一致。
採用水熱腐蝕法製備瞭鐵鈍化多孔硅樣品,樣品光緻髮光譜的熒光峰位于2.0 eV附近,半峰寬約為0.40 eV。激髮波長從240 nm增大到440 nm的過程中,熒光峰先紅移再藍移,最後基本穩定,變化麯線呈勺型。通過分析15片髮光多孔硅樣品的統計結果,髮現熒光峰逆轉所對應的激髮波長位于330 nm附近,相應的激髮光子能量約為3.8 eV。樣品光緻髮光譜隨激髮波長的勺型變化過程與≡Si—O↑和≡Si—O↑…H—O—Si≡兩類非橋氧空穴髮光中心共同作用時的髮光行為一緻。
채용수열부식법제비료철둔화다공규양품,양품광치발광보적형광봉위우2.0 eV부근,반봉관약위0.40 eV。격발파장종240 nm증대도440 nm적과정중,형광봉선홍이재람이,최후기본은정,변화곡선정작형。통과분석15편발광다공규양품적통계결과,발현형광봉역전소대응적격발파장위우330 nm부근,상응적격발광자능량약위3.8 eV。양품광치발광보수격발파장적작형변화과정여≡Si—O↑화≡Si—O↑…H—O—Si≡량류비교양공혈발광중심공동작용시적발광행위일치。
Hydrothermal etching method was employed to prepare iron-passivated porous silicon ( IP-Si) samples with peak energy around 2. 0 eV and FWHM of 0. 40 eV. As the excitation wavelength increases from 240 to 440 nm, the peak energy of photoluminescence red-shifts first, and then blue-shifts before it reaches a constant energy. The changing curve demonstrates a spoon-like pattern. By analyzing the statistics results from 15 IP-Si samples, it is found that the turnover excitation wave-length corresponding to the peak energy is about 330 nm and the related photon energy is 3. 8 eV. The spoon-like relationship found between the peak energy and excitation wavelength is in good agreement with the photoluminescence behavior under the combined action of two types of non-bridg-ing oxygen hole center of≡Si—O↑and≡Si—O↑…H—O—Si≡.