功能材料
功能材料
공능재료
JOURNAL OF FUNCTIONAL MATERIALS
2012年
7期
820-822,827
,共4页
王乐%张亚军%祖帅%钟传杰
王樂%張亞軍%祖帥%鐘傳傑
왕악%장아군%조수%종전걸
OTFT%复合绝缘膜%电子陷阱%漏电机理
OTFT%複閤絕緣膜%電子陷阱%漏電機理
OTFT%복합절연막%전자함정%루전궤리
OTFT%composite insulator%electron traps%leakage mechanism
介电常数分别为2.6的聚甲基丙烯酸甲酯(PMMA)及介电常数为16的偏氟乙烯-三氟乙烯共聚物(P(VDF-TrFE))两种不同的有机绝缘材料,通过溶液旋涂的方法在P型硅衬底上制备了不同结构的复合栅介质膜并测试了它们的高频C-V特性及漏电特性。实验结果表明Si-PMMA-P(VDF-TrFE)-Ag结构绝缘膜上单位面积电容达到了35nF/cm2,40V电压下漏电流随着扫描次数的增加逐渐由7.29×10-7 A/cm2降低至3.44×10-7 A/cm2。而Si-P(VDF-TrFE)-PM-MA-Ag结构栅介质膜测得的单位面积电容仅为15nF/cm2,在相同电压下的单位面积漏电流为1.93×10-8 A/cm2。在此基础上分析了电子陷阱以及电场强度对双层栅绝缘膜C-V、I-V特性的影响。
介電常數分彆為2.6的聚甲基丙烯痠甲酯(PMMA)及介電常數為16的偏氟乙烯-三氟乙烯共聚物(P(VDF-TrFE))兩種不同的有機絕緣材料,通過溶液鏇塗的方法在P型硅襯底上製備瞭不同結構的複閤柵介質膜併測試瞭它們的高頻C-V特性及漏電特性。實驗結果錶明Si-PMMA-P(VDF-TrFE)-Ag結構絕緣膜上單位麵積電容達到瞭35nF/cm2,40V電壓下漏電流隨著掃描次數的增加逐漸由7.29×10-7 A/cm2降低至3.44×10-7 A/cm2。而Si-P(VDF-TrFE)-PM-MA-Ag結構柵介質膜測得的單位麵積電容僅為15nF/cm2,在相同電壓下的單位麵積漏電流為1.93×10-8 A/cm2。在此基礎上分析瞭電子陷阱以及電場彊度對雙層柵絕緣膜C-V、I-V特性的影響。
개전상수분별위2.6적취갑기병희산갑지(PMMA)급개전상수위16적편불을희-삼불을희공취물(P(VDF-TrFE))량충불동적유궤절연재료,통과용액선도적방법재P형규츤저상제비료불동결구적복합책개질막병측시료타문적고빈C-V특성급루전특성。실험결과표명Si-PMMA-P(VDF-TrFE)-Ag결구절연막상단위면적전용체도료35nF/cm2,40V전압하루전류수착소묘차수적증가축점유7.29×10-7 A/cm2강저지3.44×10-7 A/cm2。이Si-P(VDF-TrFE)-PM-MA-Ag결구책개질막측득적단위면적전용부위15nF/cm2,재상동전압하적단위면적루전류위1.93×10-8 A/cm2。재차기출상분석료전자함정이급전장강도대쌍층책절연막C-V、I-V특성적영향。
Based on solution processing,use two kinds of materials which have different dielectric constant,2.6 for PMMA and 16 for P(VDF-TrFE).Fabricate two different structures of double-layer insulating films on P type silicon substrates and test their high frequency C-V characteristic and leakage characteristics.For Si-PMMA-P(VDF-TrFE)-Ag structure,the capacitance per unit is 35nF/cm2 and leakage current under 40V decrease gradually from 7.29×10-7A/cm2 to 3.44×10-7A/cm2 with the number of scans increase.When comes to the Si-P(VDF-TrFE)-PMMA-Ag structure,the capacitance measured is only 15nF/cm2,and the leakage current is 1.93×10-8A/cm2 at the same voltage.Based on this we analysis the influence of electron traps and electric field strength for the C-V and I-V characteristics in double layer insulating films.