CAJ | 학술논문

在半导体微纳加工技术中,纳米压印由于具备低成本、高产出、超高分辨率等诸多优势而备受研究者和半导体厂商的青睐,有望成为下一代光刻技术的重要备选支撑技术之一.然而在其施压流程中,由于气体诱捕或陷入所造成的气泡缺陷问题直接关系到图案复制的成功率和完整性,因此避免气泡缺陷,阻止气泡进入模穴是亟待解决的关键问题.提出一种适用于在气体环境中进行气压压缩式纳米压印工艺并避免气体进入掩膜板基板间隙的方法.采用带有刻蚀一定宽度凸出环的掩膜板,凸出环与基板形成环板毛细缝隙,图形转移介质流体在其中形成毛细液桥,使掩膜板-介质-基板形成独立的封闭腔,转移介质黏附力所产生的静摩擦力及介质流体表面张力所诱导的毛细力抵抗施压气体,有效地阻止气体进入空穴形成气泡缺陷.通过理论解析推导求出针对具有不同表面特性转移介质流体的凸出环有效宽度,为掩膜板制备提供理论依据.
재반도체미납가공기술중,납미압인유우구비저성본、고산출、초고분변솔등제다우세이비수연구자화반도체엄상적청래,유망성위하일대광각기술적중요비선지탱기술지일.연이재기시압류정중,유우기체유포혹함입소조성적기포결함문제직접관계도도안복제적성공솔화완정성,인차피면기포결함,조지기포진입모혈시극대해결적관건문제.제출일충괄용우재기체배경중진행기압압축식납미압인공예병피면기체진입엄막판기판간극적방법.채용대유각식일정관도철출배적엄막판,철출배여기판형성배판모세봉극,도형전이개질류체재기중형성모세액교,사엄막판-개질-기판형성독립적봉폐강,전이개질점부력소산생적정마찰력급개질류체표면장력소유도적모세력저항시압기체,유효지조지기체진입공혈형성기포결함.통과이론해석추도구출침대구유불동표면특성전이개질류체적철출배유효관도,위엄막판제비제공이론의거.
@@@@Nanoimprint lithography has the advantages of low-cost, high-throughput, ultrahigh resolution, which could make it one of the next generation lithography technologies. However, the bubble-defect is always a problem which may damage the duplicate patterns, so it is an urgent issue to propose effective solutions. A novel methods, which is suitable for compressional gas cushion press nanoimprint lithography in gas atmosphere and could prevent gas from entering the gap between mold and substrate, is presented here. The annular plate capillary gap formed between the smooth substrate and the prominent O-ring processed by etching the original mold would be filled with the fluid medium. The capillary liquid bridge between the O-ring and substrate produces a closed cavity. The stiction induced by adhesion force and the capillary force induced by air-liquid surface tension could resist the compressed gas and avoid the bubble defect. The effective widths of the prominent O-ring, which are different for various fluids with different surface properties, are deduced by theory analysis. The analysis results provide theoretical basis for the preparation of the mold.