CAJ | 학술논문

主要阐述了内层DES(显影、蚀刻、剥离工艺)残铜缺陷的种类,导致DES残铜缺陷的污染源的定位.对不同DES残铜缺陷进行分类研究,首先对显影类残铜缺陷进行了定位性试验验证,确定污染物来源于显影水洗第一缸,原因为水溶性干膜由于溶解度的剧烈变化导致有机物的析出从而导致了后续的显影类残铜和蚀刻类残铜.对于蚀刻类残铜的来源进行了分析定位,同时给出了控制措施.对以上措施的综合性实施后,残铜数据有较前期有明显的改善并能够长时间稳定在优良水平.
주요천술료내층DES(현영、식각、박리공예)잔동결함적충류,도치DES잔동결함적오염원적정위.대불동DES잔동결함진행분류연구,수선대현영류잔동결함진행료정위성시험험증,학정오염물래원우현영수세제일항,원인위수용성간막유우용해도적극렬변화도치유궤물적석출종이도치료후속적현영류잔동화식각류잔동.대우식각류잔동적래원진행료분석정위,동시급출료공제조시.대이상조시적종합성실시후,잔동수거유교전기유명현적개선병능구장시간은정재우량수평.
This paper mainly elaborated the innerlayer DES copper residue defects, which resulted in DES copper residue defects and was the pollution source. We made different DES residual copper defect classification. We first we made the developing type copper residue defects positioning test verification, to determine the pollutant source in developing washed first cylinder, and found the reasons for water soluble dry film as the solubility of the organic led to dramatic changes in precipitation, which led to the subsequent development of residual copper and etching class copper residue. For the etched copper residue sources we analyzed and made positioning, at the same time provided the control measures. After the above measures were comprehensive implemented, copper residue data was relatively improved and long time stable and good level could be maintained.