中国有色金属学报
中國有色金屬學報
중국유색금속학보
THE CHINESE JOURNAL OF NONFERROUS METALS
2013年
4期
1079-1085
,共7页
罗炳池%李恺%李佳%谭秀兰%周民杰%张吉强%罗江山%吴卫东%唐永建
囉炳池%李愷%李佳%譚秀蘭%週民傑%張吉彊%囉江山%吳衛東%唐永建
라병지%리개%리가%담수란%주민걸%장길강%라강산%오위동%당영건
Be 薄膜%等轴晶%沉积速率%表面粗糙度
Be 薄膜%等軸晶%沉積速率%錶麵粗糙度
Be 박막%등축정%침적속솔%표면조조도
Be films%equiaxed grain%deposition velocity%surface roughness
采用真空蒸镀法分别在 K9和 Si(100)基片上制备 Be 薄膜,在相同沉积速率下,K9基片上 Be 薄膜生长形态和 Si 基片上 Be 薄膜生长形态存在差异.但是两者随沉积速率增加具有相似的演变规律,即由等轴晶变化至纤维晶,再至粗大等轴晶.XRD 和 XPS 分析结果表明:不同基片和蒸发温度下制备的 Be 薄膜均主要由 HCP 结构的α-Be 相组成,且表面存在一定氧化;对于非晶 K9基片,Be 薄膜晶粒取向较单一,(101)始终为显露晶面;而单晶 Si(100)基片上 Be 晶粒取向多样,在一定沉积速率下显露特定晶面;相同沉积时间下 K9和 Si(100)基体上生长的 Be 薄膜粗糙度 Rq 变化趋势十分相似,两者随 Be 薄膜沉积速率(v)增加先急剧增大后趋于平缓;以细小等轴晶生长的薄膜表面光洁度较高,而以纤维晶或粗大混晶生长的薄膜表面粗糙度较大.
採用真空蒸鍍法分彆在 K9和 Si(100)基片上製備 Be 薄膜,在相同沉積速率下,K9基片上 Be 薄膜生長形態和 Si 基片上 Be 薄膜生長形態存在差異.但是兩者隨沉積速率增加具有相似的縯變規律,即由等軸晶變化至纖維晶,再至粗大等軸晶.XRD 和 XPS 分析結果錶明:不同基片和蒸髮溫度下製備的 Be 薄膜均主要由 HCP 結構的α-Be 相組成,且錶麵存在一定氧化;對于非晶 K9基片,Be 薄膜晶粒取嚮較單一,(101)始終為顯露晶麵;而單晶 Si(100)基片上 Be 晶粒取嚮多樣,在一定沉積速率下顯露特定晶麵;相同沉積時間下 K9和 Si(100)基體上生長的 Be 薄膜粗糙度 Rq 變化趨勢十分相似,兩者隨 Be 薄膜沉積速率(v)增加先急劇增大後趨于平緩;以細小等軸晶生長的薄膜錶麵光潔度較高,而以纖維晶或粗大混晶生長的薄膜錶麵粗糙度較大.
채용진공증도법분별재 K9화 Si(100)기편상제비 Be 박막,재상동침적속솔하,K9기편상 Be 박막생장형태화 Si 기편상 Be 박막생장형태존재차이.단시량자수침적속솔증가구유상사적연변규률,즉유등축정변화지섬유정,재지조대등축정.XRD 화 XPS 분석결과표명:불동기편화증발온도하제비적 Be 박막균주요유 HCP 결구적α-Be 상조성,차표면존재일정양화;대우비정 K9기편,Be 박막정립취향교단일,(101)시종위현로정면;이단정 Si(100)기편상 Be 정립취향다양,재일정침적속솔하현로특정정면;상동침적시간하 K9화 Si(100)기체상생장적 Be 박막조조도 Rq 변화추세십분상사,량자수 Be 박막침적속솔(v)증가선급극증대후추우평완;이세소등축정생장적박막표면광길도교고,이이섬유정혹조대혼정생장적박막표면조조도교대.
@@@@Be films grown on K9 and Si(100) substrates were fabricated by an evaporation deposition method. At the same deposition velocity, the growth morphology of Be films grown on the K9 substrate is different from that grown on the Si(100) substrate. Whereas, both of them have the similar evolution rule with the increase of deposition velocity, which changes from an equiaxed grain to a fiber grain, and then to a coarsening equiaxed grain. XRD and XPS analyses indicate that the Be films grown on different substrates at different deposition velocities consist mainly of HCP structureα-Be phase, and all of the Be film surface is oxidized. For the amorphous K9 substrate, the preferential growth orientation of Be film is always exposed to (101) crystal face. While, the grain orientation of the Si substrate is diversiform, a special crystal face can be shown at a certain deposition velocity. For the Be films grown on K9 substrate and Si(100) substrate, their variation trend of roughness Rq is similar at the same deposition time. Both of them increase sharply with the increase of deposition velocity, and then enhance slightly. The Be films with an equiaxed grain is very smooth, while the surface roughness of the fiber grain and coarsening mixed grain is very large.