红外与激光工程
紅外與激光工程
홍외여격광공정
INFRARED AND LASER ENGINEERING
2013年
2期
381-386
,共6页
恒定曝光量%凹球面%网栅%激光直写%伺服控制
恆定曝光量%凹毬麵%網柵%激光直寫%伺服控製
항정폭광량%요구면%망책%격광직사%사복공제
constant exposure%concave spherical substrate%mesh%laser direct writing%servo control
为在深凹球面内激光直写高质量网栅图形,必须实现写入过程恒定曝光量控制.首先介绍了深凹球面网栅激光直写设备原理,然后分析了任意纬线扫描运动状态,推导了工件尺寸、网栅参数、扫描速度间数学关系,最后建立了恒定曝光量扫描运动数学模型,开发了伺服控制软、硬件系统,确保了扫描角速度随纬度自动精确调整来保持线速度不变,实现了深凹球面网栅激光直写恒定曝光量控制,提高了写入线条质量.在矢跨比为0.31的深凹球面内制备了周期500滋m的网栅,显影后测得线条线宽均匀,侧壁陡直,线宽误差臆依1%,网格周期误差臆依5%.
為在深凹毬麵內激光直寫高質量網柵圖形,必鬚實現寫入過程恆定曝光量控製.首先介紹瞭深凹毬麵網柵激光直寫設備原理,然後分析瞭任意緯線掃描運動狀態,推導瞭工件呎吋、網柵參數、掃描速度間數學關繫,最後建立瞭恆定曝光量掃描運動數學模型,開髮瞭伺服控製軟、硬件繫統,確保瞭掃描角速度隨緯度自動精確調整來保持線速度不變,實現瞭深凹毬麵網柵激光直寫恆定曝光量控製,提高瞭寫入線條質量.在矢跨比為0.31的深凹毬麵內製備瞭週期500滋m的網柵,顯影後測得線條線寬均勻,側壁陡直,線寬誤差臆依1%,網格週期誤差臆依5%.
위재심요구면내격광직사고질량망책도형,필수실현사입과정항정폭광량공제.수선개소료심요구면망책격광직사설비원리,연후분석료임의위선소묘운동상태,추도료공건척촌、망책삼수、소묘속도간수학관계,최후건립료항정폭광량소묘운동수학모형,개발료사복공제연、경건계통,학보료소묘각속도수위도자동정학조정래보지선속도불변,실현료심요구면망책격광직사항정폭광량공제,제고료사입선조질량.재시과비위0.31적심요구면내제비료주기500자m적망책,현영후측득선조선관균균,측벽두직,선관오차억의1%,망격주기오차억의5%.
For the purpose of fabricating high-quality mesh in a deep concave spherical substrate by laser direct writing technique, the constant exposure dose control must be realized during the whole scanning process. Firstly, the principle of the equipment for fabricating mesh in a deep concave spherical substrate via laser direct writing technique was introduced. Then scanning motion states for writing arbitrary line of latitude were analyzed, and the formulas that expresses the mathematical relationships between the dimensions of the substrate, parameters of mesh and the scanning velocity were deduced. The mathematical model of scanning with constant exposure dose was built, and the servo control system including software and hardware was developed according to the mathematical model. The servo control system could tune the scanning angular velocity precisely according to the latitude of lines to maintain the linear velocity invariantly, so as to keep the exposure dose constant and improve the quality of lines. So far, constant exposure dose control was realized finally. Mesh with 500μm gridding period was fabricated in a deep concave spherical substrate with a rise-span ratio of 0.31. Lines on the substrate have good uniformity, steep and straight side walls parallel to each other after development, and errors of line width and gridding period are within ±1% and ±5%, respectively.