CAJ | 학술논문

采用阳极型气体离子源结合非平衡磁控溅射的方法,在单晶硅及Ti6Al4V钛合金基体上制备掺钨类金刚石多层膜(DLC/WC),利用俄歇电子谱(AES)、透射电镜(TEM)、X射线光电子能谱(XPS)及X射线衍射(XRD)等对膜层的过渡层、界面及微观结构进行研究.结果表明:所制备的膜层厚2.7μm,硬度高达3550HV,摩擦因数为0.139,与Ti6Al4V基体结合力为52 N;W主要以纳米晶WC的形式与非晶DLC形成WC/DLC多层膜,该多层膜仍呈现出类金刚石膜的主要特征.
채용양겁형기체리자원결합비평형자공천사적방법,재단정규급Ti6Al4V태합금기체상제비참오류금강석다층막(DLC/WC),이용아헐전자보(AES)、투사전경(TEM)、X사선광전자능보(XPS)급X사선연사(XRD)등대막층적과도층、계면급미관결구진행연구.결과표명:소제비적막층후2.7μm,경도고체3550HV,마찰인수위0.139,여Ti6Al4V기체결합력위52 N;W주요이납미정WC적형식여비정DLC형성WC/DLC다층막,해다층막잉정현출류금강석막적주요특정.
@@@@Anodic gas ion beam source (IBS) and unbalance magnetron sputtering (UBM) were employed to deposit diamond-like carbon/WC (DLC/WC) multilayer film on Si. Auger electron spectroscopy (AES), transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), X-ray diffractometry (XRD) and microhardness tester were employed to evaluate the interface, microstructure and composition of films. The results show that the film thickness is 2.7μm, hardness up to 3 550HV, the friction coefficient is 0.139, and adhesion strength is 52 N in Ti6Al4V substrate. In the film, nanocrystalline WC and amorphous DLC layer overlap the formation of DLC/WC multilayers. The multilayer film still shows that the main features, which are very similar to the DLC film.