CAJ | 학술논문

采用射频磁控溅射法制备不同厚度Mo衬底的Ni-Mn-Ga薄膜,采用扫描电子显微镜(FE-SEM)、原子力显微镜(AFM)、磁力显微镜(MFM)、振动样品磁强计(VSM)以及 X 射线衍射仪(XRD)对其形貌及磁性能进行观测和分析.实验发现,制备的Mo衬底Ni-Mn-Ga薄膜经退火后为T型马氏体结构,且当Mo衬底厚度在0~200 nm范围内变化时,其饱和磁化强度及居里温度呈现先减小后增大的趋势.当Mo衬底厚度约为100 nm时饱和磁化强度和居里温度具有最低值.薄膜表面颗粒直径随着Mo厚度的增大而减小,但在Mo厚为100 nm时出现增大.
채용사빈자공천사법제비불동후도Mo츤저적Ni-Mn-Ga박막,채용소묘전자현미경(FE-SEM)、원자력현미경(AFM)、자력현미경(MFM)、진동양품자강계(VSM)이급 X 사선연사의(XRD)대기형모급자성능진행관측화분석.실험발현,제비적Mo츤저Ni-Mn-Ga박막경퇴화후위T형마씨체결구,차당Mo츤저후도재0~200 nm범위내변화시,기포화자화강도급거리온도정현선감소후증대적추세.당Mo츤저후도약위100 nm시포화자화강도화거리온도구유최저치.박막표면과립직경수착Mo후도적증대이감소,단재Mo후위100 nm시출현증대.
Ni-Mn-Ga shape memory thin films were prepared by radio-frequency magnetron sputtering on Mo substrates with different thicknesses. The effects of substrate thickness on the morphology and magnetic properties of Ni-Mn-Ga thin films were studied by AFM, MFM and VSM. The results indicates that Ni-Mn-Ga films with Mo substrate are T-type martensite;the saturation magnetization and the Curie temperature of the film decrease first and then increase with increasing Mo substrate thickness in the range of 0-200 nm, with minimum saturation magnetization and Curie temperature for sample with 100-nm-thickness Mo substrate. The surface particle size of Ni-Mn-Ga film decreases with increasing Mo thickness, but abnormally increases for 100-nm-thick sample.