物理学报
物理學報
물이학보
2013年
11期
444-450
,共7页
张百强%郑中山%于芳%宁瑾%唐海马%杨志安?
張百彊%鄭中山%于芳%寧瑾%唐海馬%楊誌安?
장백강%정중산%우방%저근%당해마%양지안?
绝缘体上硅(SOI)材料%注氮%注氟%埋氧层正电荷密度
絕緣體上硅(SOI)材料%註氮%註氟%埋氧層正電荷密度
절연체상규(SOI)재료%주담%주불%매양층정전하밀도
silicon on insulator (SOI)%nitrogen implantation%fluorine implantation%positive charge density in buried oxide layer
为了抑制埋层注氮导致的埋层内正电荷密度的上升,本文采用氮氟复合注入方式,向先行注氮的埋层进行了注氮之后的氟离子注入,并经适当的退火,对埋层进行改性.利用高频电容-电压(C-V)表征技术,对复合注入后的埋层进行了正电荷密度的表征.结果表明,在大多数情况下,氮氟复合注入能够有效地降低注氮埋层内的正电荷密度,且其降低的程度与注氮后的退火时间密切相关.分析认为,注氟导致注氮埋层内的正电荷密度降低的原因是在埋层中引入了与氟相关的电子陷阱.另外,实验还观察到,在个别情况下,氮氟复合注入引起了埋层内正电荷密度的进一步上升.结合测量结果,讨论分析了该现象产生的原因.
為瞭抑製埋層註氮導緻的埋層內正電荷密度的上升,本文採用氮氟複閤註入方式,嚮先行註氮的埋層進行瞭註氮之後的氟離子註入,併經適噹的退火,對埋層進行改性.利用高頻電容-電壓(C-V)錶徵技術,對複閤註入後的埋層進行瞭正電荷密度的錶徵.結果錶明,在大多數情況下,氮氟複閤註入能夠有效地降低註氮埋層內的正電荷密度,且其降低的程度與註氮後的退火時間密切相關.分析認為,註氟導緻註氮埋層內的正電荷密度降低的原因是在埋層中引入瞭與氟相關的電子陷阱.另外,實驗還觀察到,在箇彆情況下,氮氟複閤註入引起瞭埋層內正電荷密度的進一步上升.結閤測量結果,討論分析瞭該現象產生的原因.
위료억제매층주담도치적매층내정전하밀도적상승,본문채용담불복합주입방식,향선행주담적매층진행료주담지후적불리자주입,병경괄당적퇴화,대매층진행개성.이용고빈전용-전압(C-V)표정기술,대복합주입후적매층진행료정전하밀도적표정.결과표명,재대다수정황하,담불복합주입능구유효지강저주담매층내적정전하밀도,차기강저적정도여주담후적퇴화시간밀절상관.분석인위,주불도치주담매층내적정전하밀도강저적원인시재매층중인입료여불상관적전자함정.령외,실험환관찰도,재개별정황하,담불복합주입인기료매층내정전하밀도적진일보상승.결합측량결과,토론분석료해현상산생적원인.
Nitrogen ions implanted into the buried oxide layer can increase the total dose radiation hardness of silicon on insulator (SOI) materials. However, the obvious increase in positive charge density in the buried layer with high dose of nitrogen implantation leads to a negative effect on the technology of nitrogen implantation into buried oxide. In order to suppress the increase in positive charge density in the nitrogen-implanted buried layer, co-implantation of nitrogen and fluorine is used to implant fluorine into the nitrogen-implanted buried layer. High-frequency voltage-capacitance (C-V) technique is used to characterize the positive charge density in the buried layer. Results show that, in most cases, using the co-implantation of nitrogen and fluorine can significantly reduce the positive charge density in the nitrogen-implanted buried layer. At the same time, it is also found that further increase of the positive charge density induced by fluorine implantation in the nitrogen-implanted buried layer can occur in particular cases. It is proposed that the decrease in the positive charge density in the fluorine and nitrogen-implanted buried layer is due to the introduction of electron traps into the buried layer through fluorine implantation.