CAJ | 학술논문

在基底与靶材之间放置磁性强弱不同的永久磁铁来研究外加磁场对磁控溅射制备氮化硅陷光薄膜的影响.通过X射线衍射、原子力显微镜(AFM)以及紫外分光光度计分别测试了外加磁场前后所制备薄膜的组织结构、表面形貌和光学性能.结果表明,外加磁场后,氮化硅薄膜依然呈现非晶结构;但是表面形貌发生明显改变,中心磁场1.50 T下,薄膜表面为特殊锥状尖峰结构“类金字塔”的突起,而且这些突起颗粒垂直于基底表面;在可见光及近红外范围内,中心磁场1.50 T下的薄膜样品平均透射率最大,平均透射率达到90%以上,比未加磁场的样品提高了近1倍,具有很好的陷光特性.
재기저여파재지간방치자성강약불동적영구자철래연구외가자장대자공천사제비담화규함광박막적영향.통과X사선연사、원자력현미경(AFM)이급자외분광광도계분별측시료외가자장전후소제비박막적조직결구、표면형모화광학성능.결과표명,외가자장후,담화규박막의연정현비정결구;단시표면형모발생명현개변,중심자장1.50 T하,박막표면위특수추상첨봉결구“류금자탑”적돌기,이차저사돌기과립수직우기저표면;재가견광급근홍외범위내,중심자장1.50 T하적박막양품평균투사솔최대,평균투사솔체도90%이상,비미가자장적양품제고료근1배,구유흔호적함광특성.
In the applied magnetic field different magnetic intensities in the permanent magnet were introduced between the substrate and target, so as to study their influence on the properties of silicon thin films with light trapping structure prepared by R.F. magnetron sputtering. The microstructures, surface morphology and optical properties of the films were characterized by X-ray diffraction, atomic force microscope (AFM) and ultraviolet spectrophotometer separately. Results show that the silicon nitride thin films are still in amorphous state although an magnetic field was applied on them;however, when the magnetic field in the center is of 1.5 T, the surface morphology of the films has dramatically changed to a special peak structure, i.e. pyramid-like protuberances which are perpendicular to the basal surface;meanwhile, in the visible and near infrared range, the average transmittance of the sample is the highest, which is more than 90%, nearly twice as much as the transmittance of the sample without applied magnetic field, thus the light trapping effect is the great.