CAJ | 학술논문

铜是目前用于化学气相沉淀(CVD)法制备石墨烯应用最广泛的一种催化剂，其表面形貌状态直接影响石墨烯的质量。电化学抛光法是一种处理金属表面形貌的重要方法。系统研究了抛光工艺参数对铜箔表面质量以及相应石墨烯品质的影响，探讨了铜箔表面状态与石墨烯透过率、导电性及石墨烯层数的关联特性。研究发现，抛光处理后铜箔生长的石墨烯的品质较未处理铜箔生长的有明显提高。在一定抛光电流密度范围，抛光电流密度越大，铜箔表面越平整，在抛光处理后的铜箔上生长的石墨烯结晶缺陷态逐渐减少，单层性与均匀性越来越好好，透过率和导电性也显著提高。
동시목전용우화학기상침정(CVD)법제비석묵희응용최엄범적일충최화제，기표면형모상태직접영향석묵희적질량。전화학포광법시일충처리금속표면형모적중요방법。계통연구료포광공예삼수대동박표면질량이급상응석묵희품질적영향，탐토료동박표면상태여석묵희투과솔、도전성급석묵희층수적관련특성。연구발현，포광처리후동박생장적석묵희적품질교미처리동박생장적유명현제고。재일정포광전류밀도범위，포광전류밀도월대，동박표면월평정，재포광처리후적동박상생장적석묵희결정결함태축점감소，단층성여균균성월래월호호，투과솔화도전성야현저제고。
Copper was a widely used catalyst for graphene synthesis by chemical vapor deposition (CVD),whose surface quality has great influence on the graphene quality.Electrochemical polishing was an important method of pre-treatment of the metal surface morphology.In this paper,we comprehensively discussed the relationship between process parameter of electrochemical polish with surface morphology and graphene quality.It was found that,compared with the graphene grown on the unpolished copper foil,the qualities of the graphene grown on the polished copper foil improved significantly.And,at certain current density range,the surface morphology is in direct ratio with the polishing voltage.Correspondingly the graphene has less defects,better monolayers,transmittance and conductivity.