广西大学学报(自然科学版)
廣西大學學報(自然科學版)
엄서대학학보(자연과학판)
JOURNAL OF GUANGXI UNIVERSITY (NATURAL SCIENCE EDITION)
2014年
6期
1399-1402
,共4页
次氯酸钠溶液%一步法%砷浸出率%氧化脱硫
次氯痠鈉溶液%一步法%砷浸齣率%氧化脫硫
차록산납용액%일보법%신침출솔%양화탈류
sodium hypochlorite solution%one step method%leaching rate of arsenic%oxidative des-ulfurization
为解决传统浸砷工艺的浸出率低和操作时间长等问题,利用次氯酸钠溶液中OH-的溶砷作用和ClO-的氧化脱硫功能,用次氯酸钠溶液作浸出剂,研究磷酸富砷渣中砷浸出时次氯酸钠溶液用量、浸出温度以及浸出时间对砷浸出率和浸出液中AsS33-氧化脱硫程度的影响规律。结果表明,与传统的碱浸和空气氧化浸出工艺相比,次氯酸钠溶液一步法的浸出时间由原来的十多个小时缩短到10 min。在次氯酸钠的用量为理论用量的4倍、浸出时间为10 min、浸出温度为30℃时,砷浸出率达98.52%,浸出液中AsS33-的硫被完全氧化脱出,实现了砷高效浸出和硫完全脱出的一步法工艺。
為解決傳統浸砷工藝的浸齣率低和操作時間長等問題,利用次氯痠鈉溶液中OH-的溶砷作用和ClO-的氧化脫硫功能,用次氯痠鈉溶液作浸齣劑,研究燐痠富砷渣中砷浸齣時次氯痠鈉溶液用量、浸齣溫度以及浸齣時間對砷浸齣率和浸齣液中AsS33-氧化脫硫程度的影響規律。結果錶明,與傳統的堿浸和空氣氧化浸齣工藝相比,次氯痠鈉溶液一步法的浸齣時間由原來的十多箇小時縮短到10 min。在次氯痠鈉的用量為理論用量的4倍、浸齣時間為10 min、浸齣溫度為30℃時,砷浸齣率達98.52%,浸齣液中AsS33-的硫被完全氧化脫齣,實現瞭砷高效浸齣和硫完全脫齣的一步法工藝。
위해결전통침신공예적침출솔저화조작시간장등문제,이용차록산납용액중OH-적용신작용화ClO-적양화탈류공능,용차록산납용액작침출제,연구린산부신사중신침출시차록산납용액용량、침출온도이급침출시간대신침출솔화침출액중AsS33-양화탈류정도적영향규률。결과표명,여전통적감침화공기양화침출공예상비,차록산납용액일보법적침출시간유원래적십다개소시축단도10 min。재차록산납적용량위이론용량적4배、침출시간위10 min、침출온도위30℃시,신침출솔체98.52%,침출액중AsS33-적류피완전양화탈출,실현료신고효침출화류완전탈출적일보법공예。
Aiming at solving the disadvantages of low leaching rate of arsenic and long operating time in traditional arsenic leaching processes, the arsenic was oxidatively leached from rich arsenic residue produced in phosphoric acid plant by using sodium hypochlorite solution as leaching reagent, in which the OH-was used for leaching arsenic and ClO-was used for oxidative desulfurization. The effects of dosage of sodium hypochlorite solution, leaching temperature and leaching time on the leaching rate of arsenic and desulfurization efficiency of AsS3 3- in leaching solution were studied re-spectively. The results showed that the leaching time declined from more than ten hours to only 10 minutes compared with that of traditional arsenic leaching process by alkali leaching and atmos-pheric oxidation. The leaching rate of arsenic could reach 98. 52% and the AsS3 3-in leaching solu-tion was completely oxidated and desulfurated under the conditions that the actual dosage of sodium hypochlorite solution was 4 times of the theoretical dosage, leaching time of 10 min, and leaching temperature at 30 ℃. On the basis of the proposed technologies, this process provides a simple and efficient technological route for comprehensive utilization of rich arsenic residue.