CAJ | 학술논문

在NaCl-KCl-NaF-WO3的熔盐体系中在Cu电极上制备了致密的钨沉积层；采用扫描电镜和辉光放电等方法，分析了熔盐组分对钨沉积层的影响。结果表明，当c(NaF)＝0.1时，基板表面W含量约为75%；当c(NaF)＝0.25和0.4时，基板表面钨含量达到近95%。当熔盐组分摩尔比为c(NaCl)∶c(KCl)∶c(NaF)∶c(WO3)＝0.3385∶0.3385∶0.25∶0.073时，可获得致密而且表面质量较好的钨沉积层。
재NaCl-KCl-NaF-WO3적용염체계중재Cu전겁상제비료치밀적오침적층；채용소묘전경화휘광방전등방법，분석료용염조분대오침적층적영향。결과표명，당c(NaF)＝0.1시，기판표면W함량약위75%；당c(NaF)＝0.25화0.4시，기판표면오함량체도근95%。당용염조분마이비위c(NaCl)∶c(KCl)∶c(NaF)∶c(WO3)＝0.3385∶0.3385∶0.25∶0.073시，가획득치밀이차표면질량교호적오침적층。
The deposition of tungsten was obtained in the NaCl-KCl-NaF-WO3 molten salt by electrochemical reduction. The effects of composition of the molten salt on the deposition of tungsten were investigated by means of scanning electron microscopy and glow discharge spectrometer. The results showed that the dense tungsten layer with good surface quality was obtained when the mole fraction of molten salt is c (NaCl)∶c (KCl)∶c (NaF)∶c (WO3)=0.338 5∶0.3385∶0.25∶0.073; the surface content of tungsten is 75% when c(NaF) is 0.1; the surface content of tungsten is 95%when c(NaF) is 0.25 or 0.4.