CAJ | 학술논문

目的：在Nb-Ti-Si合金表面制备MoSi2涂层。方法先进行辉光离子渗Mo,再进行包埋渗Si。分析温度对渗Mo层表面形貌、厚度、元素互扩散的影响,以及渗Si后涂层的表面形貌和结构。结果在1100°进行辉光离子渗Mo,渗Mo层与基体形成了显著的互扩散。对渗Mo层进行包埋渗Si后,所形成的涂层组织致密,具有多层结构,由外向内依次为MoSi2层、NbSi2层和Nb5 Si3层,在MoSi2和NbSi2层之间存在( Mo,Nb) Si2互扩散区。结论通过辉光离子渗/包埋渗的方法,可以在Nb-Ti-Si合金表面制备MoSi2涂层,且涂层与基体呈冶金结合,结合较好。
목적：재Nb-Ti-Si합금표면제비MoSi2도층。방법선진행휘광리자삼Mo,재진행포매삼Si。분석온도대삼Mo층표면형모、후도、원소호확산적영향,이급삼Si후도층적표면형모화결구。결과재1100°진행휘광리자삼Mo,삼Mo층여기체형성료현저적호확산。대삼Mo층진행포매삼Si후,소형성적도층조직치밀,구유다층결구,유외향내의차위MoSi2층、NbSi2층화Nb5 Si3층,재MoSi2화NbSi2층지간존재( Mo,Nb) Si2호확산구。결론통과휘광리자삼/포매삼적방법,가이재Nb-Ti-Si합금표면제비MoSi2도층,차도층여기체정야금결합,결합교호。
ABSTRACT:Objective To prepare the MoSi2 coating on the surface of Nb-Ti-Si alloy. Methods The coating was prepared through glow plasma deposition of Mo and pack siliconization. The effects of temperature on the microstructure, thickness and ele-ment distribution of the deposited Mo layer were analyzed, and the coating structure of the Mo layer after siliconization was investi-gated. Results Elements inter-diffusion between the glow plasma deposited Mo layer and the substrate was significant at 1100 °;after siliconization, dense MoSi2 coating was formed on the substrate. The MoSi2 coating had a multi-layer structure. From the sur-face to the substrate, the MoSi2 coating was consisted of the MoSi2 layer, the NbSi2 layer and the Nb5 Si3 layer;a ( Mo,Nb) Si2 in-ter-diffusion zone was formed between the MoSi2 layer and the NbSi2 layer. Conclusion The MoSi2 coating could be prepared on the surface of the Nb-Ti-Si alloy through glow plasma deposition of Mo/pack siliconization. The coating had metallurgical bonding with the substrate.