红外与激光工程
紅外與激光工程
홍외여격광공정
INFRARED AND LASER ENGINEERING
2015年
4期
1349-1353
,共5页
王巍%颜琳淑%王川%杜超雨%王婷%王冠宇%袁军%王振
王巍%顏琳淑%王川%杜超雨%王婷%王冠宇%袁軍%王振
왕외%안림숙%왕천%두초우%왕정%왕관우%원군%왕진
Ge/Si 雪崩二极管%吸收区原电荷区原倍增区分离%器件仿真
Ge/Si 雪崩二極管%吸收區原電荷區原倍增區分離%器件倣真
Ge/Si 설붕이겁관%흡수구원전하구원배증구분리%기건방진
Ge/Si-APD%SACM%device simulation
Ge/Si吸收区-电荷区-倍增区分离(SACM)结构的APD作为一种新型光电探测器已成为硅基APD器件研究的重点。对SACM Ge/Si型APD器件的基本结构及其主要特性参数,包括量子效率、响应度、暗电流等进行了理论分析及仿真验证。实验结果表明:在给定的器件参数条件下,所设计的APD器件的雪崩击穿电压为25.7 V,最大内部量子效率为91%,单位增益下响应度峰值为0.55 A/W,在750~1500 nm范围内具有较高响应度,其峰值波长为1050 nm;在高偏压以及高光照强度情况下,倍增区发生空间电荷效应从而导致增益降低。
Ge/Si吸收區-電荷區-倍增區分離(SACM)結構的APD作為一種新型光電探測器已成為硅基APD器件研究的重點。對SACM Ge/Si型APD器件的基本結構及其主要特性參數,包括量子效率、響應度、暗電流等進行瞭理論分析及倣真驗證。實驗結果錶明:在給定的器件參數條件下,所設計的APD器件的雪崩擊穿電壓為25.7 V,最大內部量子效率為91%,單位增益下響應度峰值為0.55 A/W,在750~1500 nm範圍內具有較高響應度,其峰值波長為1050 nm;在高偏壓以及高光照彊度情況下,倍增區髮生空間電荷效應從而導緻增益降低。
Ge/Si흡수구-전하구-배증구분리(SACM)결구적APD작위일충신형광전탐측기이성위규기APD기건연구적중점。대SACM Ge/Si형APD기건적기본결구급기주요특성삼수,포괄양자효솔、향응도、암전류등진행료이론분석급방진험증。실험결과표명:재급정적기건삼수조건하,소설계적APD기건적설붕격천전압위25.7 V,최대내부양자효솔위91%,단위증익하향응도봉치위0.55 A/W,재750~1500 nm범위내구유교고향응도,기봉치파장위1050 nm;재고편압이급고광조강도정황하,배증구발생공간전하효응종이도치증익강저。
Ge/Si Separate-Absorption-Charge-Multiplication(SACM)-APD, as a new type of silicon APD, has become the focus of research. The device structure and its main parameters of Ge/Si SACM-APD (including quantum efficiency, responsivity, dark current, etc) were investigated in detail from the theory analysis and simulation. The simulation results show that the avalanche breakdown voltage is 25.7 V, the internal quantum efficiency is 90%, the maximum responsibility is up to 55 A/W when the gain is 1. The device is most sensitive in the spectral range of 750-1 500 nm. The peak wavelength of the APD is 1 050 nm. Under the condition of high bias and high light intensity, the electric field profile can be affected through the space charge of these electrons and holes.