CAJ | 학술논문

分光器件是全息光栅曝光系统中的关键光学元件，它将入射激光光束分成两束，两相干光束叠加后形成干涉条纹。曝光系统的稳定性不但影响干涉条纹对比度，还影响光栅衍射波前像差、杂散光水平以及光栅掩模刻槽质量。为了提高曝光系统的稳定性，分析入射光束角度偏离与两相干光束夹角（2θ）的关系，并结合干涉条纹周期公式，分别导出了以光栅和棱镜作为分光器件时入射激光束角度偏离量与待制作光栅空间相位差的解析表达式，据此分析了光栅和棱镜曝光系统的稳定性。结果表明，采用光栅分光的曝光系统的稳定性比棱镜分光曝光系统稳定性提高5～6个数量级，这对长时间曝光制作全息光栅具有实际意义。
분광기건시전식광책폭광계통중적관건광학원건，타장입사격광광속분성량속，량상간광속첩가후형성간섭조문。폭광계통적은정성불단영향간섭조문대비도，환영향광책연사파전상차、잡산광수평이급광책엄모각조질량。위료제고폭광계통적은정성，분석입사광속각도편리여량상간광속협각（2θ）적관계，병결합간섭조문주기공식，분별도출료이광책화릉경작위분광기건시입사격광속각도편리량여대제작광책공간상위차적해석표체식，거차분석료광책화릉경폭광계통적은정성。결과표명，채용광책분광적폭광계통적은정성비릉경분광폭광계통은정성제고5～6개수량급，저대장시간폭광제작전식광책구유실제의의。
The beamsplitter has a critical role in the interference lithography, which splits one laser beam into two, therefore these two waves can interfere to produce the fringes.The instability of the interference lithogra-phy, which is determined by the selection of the beamsplitter, not only decreases the contrast of the patterns, but also causes the phase distortion, high scatter light and low quality of the groove.To improve the stability of the interference lithography system, based on the period equation of the fringes and the correction between de-viation of the incidence and the interference beam angular variations(2θ) , we discuss the phase distortion due to the alignment error of cube and the grating beamsplitter, and analyze the stability of the two different inter-ference lithography system.Results indicate that in the grating manufacture, using the grating as the beam-splitter instead of the cube beamsplitter can increase the stability of lithography system by 5 to 6 orders of mag-nitude, which has a significant effect on grating fabrication with long-time exposure.