金刚石与磨料磨具工程
金剛石與磨料磨具工程
금강석여마료마구공정
DIAMOND & ABRASIVES ENGINNERING
2015年
2期
55-58
,共4页
徐明艳%代克%王乐军%周万里
徐明豔%代剋%王樂軍%週萬裏
서명염%대극%왕악군%주만리
Zetasizer Nano ZS%硅溶胶%纳米激光粒度仪%测试
Zetasizer Nano ZS%硅溶膠%納米激光粒度儀%測試
Zetasizer Nano ZS%규용효%납미격광립도의%측시
Zetasizer Nano ZS%silica sol%nano laser granulometer%test
使用 Zetasizer Nano ZS 型纳米激光粒度仪分别对 GRJ10030和 GRJ10050(氧化硅质量分数30%、50%,粒径约100 nm)的两种硅溶胶进行了粒度检测。结果发现:原液中存在多重散射及粒子间的相互作用。随稀释倍数增加,多重散射及粒子间相互作用被削弱,氧化硅质量分数低于10%时,两种硅溶胶的平均粒径(Z-Ave)值、多分散系数(PDI)值、粒度分布等均分别趋于一致。GRJ10030型硅溶胶5倍稀释液,GRJ10050型硅溶胶20倍稀释液,有相对集中、稳定的粒度分布,且测试重现性良好。
使用 Zetasizer Nano ZS 型納米激光粒度儀分彆對 GRJ10030和 GRJ10050(氧化硅質量分數30%、50%,粒徑約100 nm)的兩種硅溶膠進行瞭粒度檢測。結果髮現:原液中存在多重散射及粒子間的相互作用。隨稀釋倍數增加,多重散射及粒子間相互作用被削弱,氧化硅質量分數低于10%時,兩種硅溶膠的平均粒徑(Z-Ave)值、多分散繫數(PDI)值、粒度分佈等均分彆趨于一緻。GRJ10030型硅溶膠5倍稀釋液,GRJ10050型硅溶膠20倍稀釋液,有相對集中、穩定的粒度分佈,且測試重現性良好。
사용 Zetasizer Nano ZS 형납미격광립도의분별대 GRJ10030화 GRJ10050(양화규질량분수30%、50%,립경약100 nm)적량충규용효진행료립도검측。결과발현:원액중존재다중산사급입자간적상호작용。수희석배수증가,다중산사급입자간상호작용피삭약,양화규질량분수저우10%시,량충규용효적평균립경(Z-Ave)치、다분산계수(PDI)치、립도분포등균분별추우일치。GRJ10030형규용효5배희석액,GRJ10050형규용효20배희석액,유상대집중、은정적립도분포,차측시중현성량호。
Particle size and Zeta potential measurement on silica sols which sized 100 nm and mass fraction SiO 2 30%,50% respectively,were carried out by laser particle size analyzer scaled nanometer. It was founded that there existed multiple scattering phenomena and interactions between colloidal particles,which were both weakened as SiO 2 contents decreased.When the SiO 2 mass fraction were less than 10%,the values of Z-average size (Z-Ave) and polydispersity index (PDI),and particle size distribution becoming consistent with each other respectively.GRJ10030 silicon sol diluted at 5 times, and GRJ10050 silicon sol diluted at 20 times, had relatively concentrated, stable particle size distribution and showed good test reproducibility.