表面技术
錶麵技術
표면기술
SURFACE TECHNOLOGY
2015年
4期
132-136,146
,共6页
邹文兵%刘德福%胡庆%陈广林
鄒文兵%劉德福%鬍慶%陳廣林
추문병%류덕복%호경%진엄림
阵列光纤组件端面%化学机械抛光%表面粗糙度%光纤凸起量
陣列光纖組件耑麵%化學機械拋光%錶麵粗糙度%光纖凸起量
진렬광섬조건단면%화학궤계포광%표면조조도%광섬철기량
end face of optical fiber array%chemical mechanical polishing%surface roughness%fiber projection
目的：设计合理的抛光工艺方案,获得平整的阵列光纤组件端面。方法采用单因素实验法研究抛光工艺参数对阵列光纤表面粗糙度与光纤凸起量的影响,利用光学表面轮廓仪与扫描电镜进行分析与观察。结果在抛光液磨粒质量分数为2%,抛光液流量为15 mL/min,抛光压力为50 kPa,抛光盘转速为30 r/min的条件下,可以获得平整的阵列光纤组件端面。结论应用化学机械抛光技术加工阵列光纤组件,并设计合理工艺方案,可获得平整的阵列光纤组件端面,其表面粗糙度可低至42.6 nm,光纤凸起值可低至0.14μm。
目的：設計閤理的拋光工藝方案,穫得平整的陣列光纖組件耑麵。方法採用單因素實驗法研究拋光工藝參數對陣列光纖錶麵粗糙度與光纖凸起量的影響,利用光學錶麵輪廓儀與掃描電鏡進行分析與觀察。結果在拋光液磨粒質量分數為2%,拋光液流量為15 mL/min,拋光壓力為50 kPa,拋光盤轉速為30 r/min的條件下,可以穫得平整的陣列光纖組件耑麵。結論應用化學機械拋光技術加工陣列光纖組件,併設計閤理工藝方案,可穫得平整的陣列光纖組件耑麵,其錶麵粗糙度可低至42.6 nm,光纖凸起值可低至0.14μm。
목적：설계합리적포광공예방안,획득평정적진렬광섬조건단면。방법채용단인소실험법연구포광공예삼수대진렬광섬표면조조도여광섬철기량적영향,이용광학표면륜곽의여소묘전경진행분석여관찰。결과재포광액마립질량분수위2%,포광액류량위15 mL/min,포광압력위50 kPa,포광반전속위30 r/min적조건하,가이획득평정적진렬광섬조건단면。결론응용화학궤계포광기술가공진렬광섬조건,병설계합리공예방안,가획득평정적진렬광섬조건단면,기표면조조도가저지42.6 nm,광섬철기치가저지0.14μm。
ABSTRACT:Objective To obtain the flat end face of optical fiber array by designing proper polishing process plan. Methods The effects of polishing process parameters on the surface roughness of the optical fiber array and fiber projection were studied using sin-gle factor experiments, and the surface morphology was examined by Scanning Electronic Microscope and Optical Profilometer. Re-sults Flat end face of optical fiber array was obtained under the conditions of particle concentration of 2%, polishing slurry flow rate of 15 mL/min, polishing pressure of 50 kPa, and rotation speed of 30 r/min. Conclusion Using chemical mechanical polishing to process optical fiber array, in combination with designing proper polishing process parameters, a perfect end-face of optical fiber ar-ray with surface roughness of 42. 6 nm and fiber projection of 0. 14 μm was achieved.
