陶瓷学报
陶瓷學報
도자학보
JOURNAL OF CERAMICS
2015年
2期
147-151
,共5页
郭胜利%胡跃辉%胡克艳%陈义川%刘细妹%徐斌%张志明
郭勝利%鬍躍輝%鬍剋豔%陳義川%劉細妹%徐斌%張誌明
곽성리%호약휘%호극염%진의천%류세매%서빈%장지명
ZnO薄膜%溶胶-凝胶法%退火温度%光学性能
ZnO薄膜%溶膠-凝膠法%退火溫度%光學性能
ZnO박막%용효-응효법%퇴화온도%광학성능
ZnO thin iflm%sol-gel%annealing temperature%optical property
采用溶胶-凝胶旋涂法在石英玻璃衬底上生长了ZnO:Al薄膜,对所制备的薄膜在空气中用450℃、550℃和650℃的环境中进行退火,并研究不同退火温度对薄膜样品形貌和性能的影响。用场发射扫描电子显微镜(FE-SEM)、X射线衍射仪(XRD)、紫外—可见—近红外分光光度计(UV-VIS-NIR)、荧光光谱仪(PL)多种测试手段研究了不同退火温度对 ZnO:Al薄膜的结构形貌、晶格尺寸、透过率以及光致发光的影响。结果表明,该溶胶-凝胶旋涂法制备的ZnO:Al薄膜为六角纤锌矿结构,有很明显的C轴择优取向,薄膜在可见光区的透过率超过90%。随着退火温度的升高,薄膜(002)衍射峰增强,薄膜的晶粒尺寸增大,薄膜的光致发(PL)光强度增强且紫外发光边带随着退火温度的增加向短波方向移动。
採用溶膠-凝膠鏇塗法在石英玻璃襯底上生長瞭ZnO:Al薄膜,對所製備的薄膜在空氣中用450℃、550℃和650℃的環境中進行退火,併研究不同退火溫度對薄膜樣品形貌和性能的影響。用場髮射掃描電子顯微鏡(FE-SEM)、X射線衍射儀(XRD)、紫外—可見—近紅外分光光度計(UV-VIS-NIR)、熒光光譜儀(PL)多種測試手段研究瞭不同退火溫度對 ZnO:Al薄膜的結構形貌、晶格呎吋、透過率以及光緻髮光的影響。結果錶明,該溶膠-凝膠鏇塗法製備的ZnO:Al薄膜為六角纖鋅礦結構,有很明顯的C軸擇優取嚮,薄膜在可見光區的透過率超過90%。隨著退火溫度的升高,薄膜(002)衍射峰增彊,薄膜的晶粒呎吋增大,薄膜的光緻髮(PL)光彊度增彊且紫外髮光邊帶隨著退火溫度的增加嚮短波方嚮移動。
채용용효-응효선도법재석영파리츤저상생장료ZnO:Al박막,대소제비적박막재공기중용450℃、550℃화650℃적배경중진행퇴화,병연구불동퇴화온도대박막양품형모화성능적영향。용장발사소묘전자현미경(FE-SEM)、X사선연사의(XRD)、자외—가견—근홍외분광광도계(UV-VIS-NIR)、형광광보의(PL)다충측시수단연구료불동퇴화온도대 ZnO:Al박막적결구형모、정격척촌、투과솔이급광치발광적영향。결과표명,해용효-응효선도법제비적ZnO:Al박막위륙각섬자광결구,유흔명현적C축택우취향,박막재가견광구적투과솔초과90%。수착퇴화온도적승고,박막(002)연사봉증강,박막적정립척촌증대,박막적광치발(PL)광강도증강차자외발광변대수착퇴화온도적증가향단파방향이동。
The ZnO:Al thin films were deposited on the quartz glass substrates by sol-gel spray-spin coating technique. Then the three thin iflms were annealed in air at 450 °C, 550 °C and 650 °C, respectively. The inlfuence of annealing temperatures on the morphology, grain size, transmission spectrum and PL of the iflms were detected by scanning electron microscopy, X-ray diffraction (XRD), UV-Vis spectrophotometer and photoluminescence spectroscopy respectively. The results showed that the iflms had hexagonal wurtzite-structured grains, exhibited C-axis preferred orientation and the average transmittance were found to be over 90% in the visible region. As the annealing temperature increased, the (002) peaks strengthened, the grain sizes became bigger, the PL intensity increased and the band of ultraviolet emission shifted to short wavelength.