CAJ | 학술논문

为提高光刻机掩模台系统的步进扫描品质，进而提高硅片成品质量，提出一种基于S曲线的轨迹规划。对迭代学习控制进行了研究，并针对普通全局迭代算法可能造成系统在特定环节恶化的局限性，采用分段迭代补偿策略，对迭代学习控制器进行分段优化。仿真表明，分段迭代学习控制满足系统的实际需求，可以应用在掩模台系统的调试中。
위제고광각궤엄모태계통적보진소묘품질，진이제고규편성품질량，제출일충기우S곡선적궤적규화。대질대학습공제진행료연구，병침대보통전국질대산법가능조성계통재특정배절악화적국한성，채용분단질대보상책략，대질대학습공제기진행분단우화。방진표명，분단질대학습공제만족계통적실제수구，가이응용재엄모태계통적조시중。
To improve the quality of step scan of the reticle stage system of lithography, thus enhance the quality of the finished products of silicon wafers, the trajectory planning based on S-curve is proposed. The iterative learning control is studied, and in accordance with the limitations under specific part of the system becomes deterioration in the general global iteration algorithm, the iterative learning controller is optimized in segmentally by adopting segmented iterative compensation strategy. The simulation indicates that iterative learning control satisfies practical demands for the system;it can be used in commissioning of the reticle stage system.