CAJ | 학술논문

以WF 6为前驱体，采用化学气相沉积法(CVD)在纯铜基体上沉积出钨涂层。利用光学显微镜(OM)和扫描电镜(SEM)分析研究钨制品组织缺陷的形成。结果表明：反应物浓度起伏对化学气相沉积钨的显微组织具有显著影响。当n(WF 6)：n(H 2)≥1：3时，沉积物为柱状晶组织；当n(WF 6)：n(H 2)＜1：3时，该沉积层晶粒明显细化，显微组织为细晶层状结构。另外，沉积过程中杂质形状也显著影响沉积层的显微组织。当基体表面存在一维杂质时，沉积制品表面产生明显的凸起，严重影响制品的表面质量和显微组织的均匀性；当沉积过程中存在零维杂质时，沉积层出现放射状的组织结构。
이WF 6위전구체，채용화학기상침적법(CVD)재순동기체상침적출오도층。이용광학현미경(OM)화소묘전경(SEM)분석연구오제품조직결함적형성。결과표명：반응물농도기복대화학기상침적오적현미조직구유현저영향。당n(WF 6)：n(H 2)≥1：3시，침적물위주상정조직；당n(WF 6)：n(H 2)＜1：3시，해침적층정립명현세화，현미조직위세정층상결구。령외，침적과정중잡질형상야현저영향침적층적현미조직。당기체표면존재일유잡질시，침적제품표면산생명현적철기，엄중영향제품적표면질량화현미조직적균균성；당침적과정중존재령유잡질시，침적층출현방사상적조직결구。
Tungsten coatings were deposited on pure copper substrates using WF 6 as the precursor by chemical vapor deposition (CVD) method. The formation of the microstructure defects of the tungsten deposits was analyzed by OM and SEM. The results show that the reactant concentration fluctuation has a significant impact on the microstructure of tungsten prepared by CVD method. When n(WF 6 ):n(H 2 )≥1:3, the microstructure of tungsten is columnar grain;when n(WF 6 ):n(H 2 )<1:3, the grains of the deposited layer are refined and the microstructure presents a fine grains multilayer structure. Moreover, the shapes of the impurities can also influence significantly on microstructure of the layer. When there is one-dimensional impurity on the surface of substrate, the surface of deposition has obvious bulge, which seriously affects the deposits surface quality and microstructure uniformity; when there is zero dimensional impurity during the deposition process, the deposit appears radial structure.