CAJ | 학술논문

热丝化学气相沉积( HFCVD)是大面积生长金刚石膜的有效方法，在生长过程中衬底温度的高低和均匀性是影响金刚石膜生长的关键因素。本文综述了国内外学者针对HFCVD法沉积金刚石膜的温度场模拟和优化工艺参数的研究成果，指出了目前存在的问题，提出了下一步的发展方向。
열사화학기상침적( HFCVD)시대면적생장금강석막적유효방법，재생장과정중츤저온도적고저화균균성시영향금강석막생장적관건인소。본문종술료국내외학자침대HFCVD법침적금강석막적온도장모의화우화공예삼수적연구성과，지출료목전존재적문제，제출료하일보적발전방향。
Hot-filament chemical vapor deposition ( HFCVD) is an effective method for large area diamond film growth. In the process of growing,the uniformity of temperature and the temperature of the substrate are the key factors. The progress of research for thermal field simulation and parameter optimization on large area diamond film growth by HFCVD is summarized in this article. Moreover, the existing problems and development on it are put forward in this pa-per.