CAJ | 학술논문

以分子电镀法制备放射源的技术为基础，结合当前应用广泛的电刷镀技术，开展了电刷镀法制备大面积241 Am 放射源的研究。和传统的放射源制备方法相比，该方法突破了电镀槽的限制，可以任意选择源的活性面积，并且通过控制阳极镀笔在阴极上作可控制的、有规律的二维往复移动，克服了传统电镀中当源的活性面积较大时难以保证电镀源均匀性的缺点。成功制备了一批活性面积为100 mm×150 mm 的大面积241 Am放射源，研究了通电时间、电压以及镀液酸度对放射性核素241 Am 的沉积效率的影响，并对源的均匀性、牢固性进行了评价。
이분자전도법제비방사원적기술위기출，결합당전응용엄범적전쇄도기술，개전료전쇄도법제비대면적241 Am 방사원적연구。화전통적방사원제비방법상비，해방법돌파료전도조적한제，가이임의선택원적활성면적，병차통과공제양겁도필재음겁상작가공제적、유규률적이유왕복이동，극복료전통전도중당원적활성면적교대시난이보증전도원균균성적결점。성공제비료일비활성면적위100 mm×150 mm 적대면적241 Am방사원，연구료통전시간、전압이급도액산도대방사성핵소241 Am 적침적효솔적영향，병대원적균균성、뢰고성진행료평개。
Based on the molecular plating and brush plating technology,a new method for preparing large-area 241 Am source was developed.Compared with the traditional molecular plating,it broke through the restrictions of plating tank so that the active area of the source could be increased;and also,the automatic 2D travelling equipment resolved the problem of uniformity of large-area source through the controllable and well-regulated movement to and fro.Some sources were prepared to explore some experimental conditions such as time, voltage,and the acidity of solution that influenced the deposition efficiency of 241 Am.The uniformity and firmness of sources were also discussed.