电子元件与材料
電子元件與材料
전자원건여재료
ELECTRONIC COMPONENTS & MATERIALS
2015年
9期
71-74
,共4页
MEMS%多层结构%界面应力%剪切应力%剥离应力%温度载荷%分层失效
MEMS%多層結構%界麵應力%剪切應力%剝離應力%溫度載荷%分層失效
MEMS%다층결구%계면응력%전절응력%박리응력%온도재하%분층실효
MEMS%multilayer structure%interfacial stress%shear stress%peeling stress%thermal load%delamination failure
温度载荷能够引起 MEMS 多层薄膜结构发生翘曲和分层等失效模式,而界面应力则是引起这些失效的直接原因。根据Suhir.E的双金属带热应力分布理论,对温度载荷作用下MEMS界面中的剪应力和剥离应力的分析表明,这两种应力随着与界面中心距离的增大呈指数增加,在界面端处达到最大值。界面应力与材料热膨胀系数和所加载温度呈线性相关,另外还与两材料层的厚度密切相关。以铜/铬组成的双层结构为例,利用 Matlab 数值仿真研究了界面应力与材料层厚度的关系,结果表明,界面应力与两材料层厚度比有关,当铜层和铬层厚度比为1.5时,层间剪应力和剥离应力均较小,可有效提高MEMS结构的可靠性,降低分层失效的概率。
溫度載荷能夠引起 MEMS 多層薄膜結構髮生翹麯和分層等失效模式,而界麵應力則是引起這些失效的直接原因。根據Suhir.E的雙金屬帶熱應力分佈理論,對溫度載荷作用下MEMS界麵中的剪應力和剝離應力的分析錶明,這兩種應力隨著與界麵中心距離的增大呈指數增加,在界麵耑處達到最大值。界麵應力與材料熱膨脹繫數和所加載溫度呈線性相關,另外還與兩材料層的厚度密切相關。以銅/鉻組成的雙層結構為例,利用 Matlab 數值倣真研究瞭界麵應力與材料層厚度的關繫,結果錶明,界麵應力與兩材料層厚度比有關,噹銅層和鉻層厚度比為1.5時,層間剪應力和剝離應力均較小,可有效提高MEMS結構的可靠性,降低分層失效的概率。
온도재하능구인기 MEMS 다층박막결구발생교곡화분층등실효모식,이계면응력칙시인기저사실효적직접원인。근거Suhir.E적쌍금속대열응력분포이론,대온도재하작용하MEMS계면중적전응력화박리응력적분석표명,저량충응력수착여계면중심거리적증대정지수증가,재계면단처체도최대치。계면응력여재료열팽창계수화소가재온도정선성상관,령외환여량재료층적후도밀절상관。이동/락조성적쌍층결구위례,이용 Matlab 수치방진연구료계면응력여재료층후도적관계,결과표명,계면응력여량재료층후도비유관,당동층화락층후도비위1.5시,층간전응력화박리응력균교소,가유효제고MEMS결구적가고성,강저분층실효적개솔。
The failure modes such as warp and delamination in MEMS multilayer structure will happen under thermal load, and the interfacial stress caused by thermal load is the immediate cause to the failure modes. By using bimetal strip stress model advanced by Suhir.E, interfacial shearing stress and peeling stress caused by thermal load were analyzed. The analysis shows that shearing stress and peeling stress present exponential increatse along with the distance from centre of bonded pair, and increase sharply in the end until achieve maximum. Interfacial stress is influenced linearly by difference of two material thermal expansivity and temperature loaded, and also influenced by the thickness of two material layers. Bi-layer structure composed by Cu/Cr was analyzed with Matlab on the relationship between interfacial stress and material thickness. The result shows that the interfacial stress is influenced by the thickness ratio of two material layers. When the thickness ratio of Cu to Cr layer is 1.5, the shearing stress and peeling stress is both small, which can reduce the probability of delamination failure mode.