电子元件与材料
電子元件與材料
전자원건여재료
ELECTRONIC COMPONENTS & MATERIALS
2015年
9期
1-6
,共6页
杨君%殷华湘%贾云丛%李贞杰
楊君%慇華湘%賈雲叢%李貞傑
양군%은화상%가운총%리정걸
探测器%3D硅基探测器%综述%辐射%单面工艺%双面工艺%影响因素
探測器%3D硅基探測器%綜述%輻射%單麵工藝%雙麵工藝%影響因素
탐측기%3D규기탐측기%종술%복사%단면공예%쌍면공예%영향인소
detectors%3D silicon detectors%review%radiation%single-sided technics%double-sided technics%influencing factors
柱电极垂直穿通硅片衬底的3D探测器和传统平面硅基探测器相比,具有耐辐射性、快速响应、低耗尽电压等优势,然而其器件结构、制备工艺以及系统集成上与传统结构不同,面临众多的技术挑战。近年许多机构对3D 探测器开展了一系列的研究以简化其制备工艺实现工业化,本文系统性总结了3D 硅基探测器的器件种类及特点、标准制备工艺等关键技术方法与路线,并对相关器件的性能与关键影响因素作出了总结,最后简要指出了3D硅基探测器的技术改进方向。
柱電極垂直穿通硅片襯底的3D探測器和傳統平麵硅基探測器相比,具有耐輻射性、快速響應、低耗儘電壓等優勢,然而其器件結構、製備工藝以及繫統集成上與傳統結構不同,麵臨衆多的技術挑戰。近年許多機構對3D 探測器開展瞭一繫列的研究以簡化其製備工藝實現工業化,本文繫統性總結瞭3D 硅基探測器的器件種類及特點、標準製備工藝等關鍵技術方法與路線,併對相關器件的性能與關鍵影響因素作齣瞭總結,最後簡要指齣瞭3D硅基探測器的技術改進方嚮。
주전겁수직천통규편츤저적3D탐측기화전통평면규기탐측기상비,구유내복사성、쾌속향응、저모진전압등우세,연이기기건결구、제비공예이급계통집성상여전통결구불동,면림음다적기술도전。근년허다궤구대3D 탐측기개전료일계렬적연구이간화기제비공예실현공업화,본문계통성총결료3D 규기탐측기적기건충류급특점、표준제비공예등관건기술방법여로선,병대상관기건적성능여관건영향인소작출료총결,최후간요지출료3D규기탐측기적기술개진방향。
3D-detectors, with electrodes penetrating through the entire substrates, have many advantages over planar silicon sensors including radiation resistance, fast time-response and low depletion voltage. However 3D silicon detectors are different from the conventional ones in device structure, fabrication process and system integration, which results in masses of technological challenges. In recent years, many laboratories have begun research on different 3D-detector structures to simplify and industrialise the fabrication process. The structure characterization of different 3D silicon sensors and the fabrication process of the standard 3D silicon detector are analyzed systematically. Meanwhile, the crucial influencing factors of them are summarized. The technology improvement direction is briefly proposed in the end.