科技和产业
科技和產業
과기화산업
SCIENCE TECHNOLOGY AND INDUSTRIAL
2013年
4期
111~115
,共null页
纳米压印光刻 专利 统计分析
納米壓印光刻 專利 統計分析
납미압인광각 전리 통계분석
nanoimprint lithography ; patent; statistical analysis
由于具有高分辨率、高产量、低成本等特点，纳米压印光刻技术被IC业界认为是最具发展前景的下一代光刻技术之一。本文旨在通过对纳米压印光刻技术中国专利申请进行统计分析，为我国进行具有自主知识产权的纳米压印光刻技术研发和制定有效的专利战略提供参考。
由于具有高分辨率、高產量、低成本等特點，納米壓印光刻技術被IC業界認為是最具髮展前景的下一代光刻技術之一。本文旨在通過對納米壓印光刻技術中國專利申請進行統計分析，為我國進行具有自主知識產權的納米壓印光刻技術研髮和製定有效的專利戰略提供參攷。
유우구유고분변솔、고산량、저성본등특점，납미압인광각기술피IC업계인위시최구발전전경적하일대광각기술지일。본문지재통과대납미압인광각기술중국전리신청진행통계분석，위아국진행구유자주지식산권적납미압인광각기술연발화제정유효적전리전략제공삼고。
Nanoimprint lithography is regarded as one of the most promising next-generation photolithography technology in IC industry,as it has several advantages such as ultrahigh resolution, high yield and low cost. This paper aims to provide a statistical analysis for Chinese patent application in nanoimprint lithography technology,so as to offer the reference for the R＆D of nanoimprint lithography technology with independent intellectual property and the establishment ofeffective patent strategy.
