湖北工程学院学报
湖北工程學院學報
호북공정학원학보
JOURNAL OF XIAOGAN UNIVERSITY
2014年
3期
68~72
,共null页
电化学沉积 ZnO薄膜 光催化 罗丹明B
電化學沉積 ZnO薄膜 光催化 囉丹明B
전화학침적 ZnO박막 광최화 라단명B
electrochemical deposition;ZnO thin film;photocatalysis;Rhodamine B
采用两步电化学沉积法在Cu衬底上沉积得到ZnO纳米结构薄膜。用X-射线衍射(XRD)和扫描电子显微镜(SEM)对其结构及形貌进行表征,发现先在Cu衬底上沉积一层Zn致密膜,更有利于在其表面上得到附着力强、形貌较好的ZnO纳米结构膜。系统考察了沉积温度和沉积时间等工艺参数对ZnO纳米结构的影响。结果表明,沉积温度和沉积时间对晶体结构和形貌有显著影响,通过对工艺进行适宜控制可以得到结晶性良好的六方纤锌矿型ZnO纳米结构膜。以罗丹明B为目标有机污染物,分析了ZnO膜的光催化性能,表明所制备的ZnO膜可以作为光催化剂,其光催化效率可达到72.4%。
採用兩步電化學沉積法在Cu襯底上沉積得到ZnO納米結構薄膜。用X-射線衍射(XRD)和掃描電子顯微鏡(SEM)對其結構及形貌進行錶徵,髮現先在Cu襯底上沉積一層Zn緻密膜,更有利于在其錶麵上得到附著力彊、形貌較好的ZnO納米結構膜。繫統攷察瞭沉積溫度和沉積時間等工藝參數對ZnO納米結構的影響。結果錶明,沉積溫度和沉積時間對晶體結構和形貌有顯著影響,通過對工藝進行適宜控製可以得到結晶性良好的六方纖鋅礦型ZnO納米結構膜。以囉丹明B為目標有機汙染物,分析瞭ZnO膜的光催化性能,錶明所製備的ZnO膜可以作為光催化劑,其光催化效率可達到72.4%。
채용량보전화학침적법재Cu츤저상침적득도ZnO납미결구박막。용X-사선연사(XRD)화소묘전자현미경(SEM)대기결구급형모진행표정,발현선재Cu츤저상침적일층Zn치밀막,경유리우재기표면상득도부착력강、형모교호적ZnO납미결구막。계통고찰료침적온도화침적시간등공예삼수대ZnO납미결구적영향。결과표명,침적온도화침적시간대정체결구화형모유현저영향,통과대공예진행괄의공제가이득도결정성량호적륙방섬자광형ZnO납미결구막。이라단명B위목표유궤오염물,분석료ZnO막적광최화성능,표명소제비적ZnO막가이작위광최화제,기광최화효솔가체도72.4%。
ZnO nanostructure films are obtained on Cu substrate by using a two-step electrochemical deposition technique.The structures and morphologies are characterized by X-ray diffraction(XRD)and scanning electron microscopy(SEM).It is shown that Zn compact films pre-deposited on the Cu substrate are beneficial to the growth of ZnO nanostructure films.In addition,a systematical investigation is made for the effects of the deposition temperature and time on the morphologies of the ZnO films.The results show that the deposition temperature and time have obvious impact on the morphologies of the ZnO nanostructures,and that highly-crystalline ZnO films with hexagonal wurtzite structure can be obtained through suitable process conditions.Rhodamine B is used as the target organic pollutants to explore the photocatalytic performance,indicating that the prepared ZnO films can be used as a photocatalyst whose photocatalytic efficiency is as high as 72.4%.