红外技术
紅外技術
홍외기술
Infrared Technology
2015年
9期
778-782
,共5页
刘峰%石峰%焦岗成%师宏立%苗壮%任彬
劉峰%石峰%焦崗成%師宏立%苗壯%任彬
류봉%석봉%초강성%사굉립%묘장%임빈
场助式光阴极%短波红外阈%InGaAs%异质结
場助式光陰極%短波紅外閾%InGaAs%異質結
장조식광음겁%단파홍외역%InGaAs%이질결
field-assisted photocathode%short-wave infrared threshold%InGaAs%heterojunction
针对一种短波红外阈透射式光阴极,简要介绍其光子吸收层和电子发射层分离式异质结结构后,结合异质结两侧对红外光子显著吸收效应参数和对电子高效输运特性参数进行建模,详细研究了场助电压对p-p型异质结能带结构和对短波红外阈透射式光电阴极的影响。研究结果显示:Schottky势垒偏压至少要达到8 V才能较好消除p-InGaAs/p-InP异质结的势垒影响。此时,为达到较小的漏电流, In0.53Ga0.47As光吸收层厚度2?m,InP发射层厚度1?m,掺杂浓度均为1×1016 cm-3。
針對一種短波紅外閾透射式光陰極,簡要介紹其光子吸收層和電子髮射層分離式異質結結構後,結閤異質結兩側對紅外光子顯著吸收效應參數和對電子高效輸運特性參數進行建模,詳細研究瞭場助電壓對p-p型異質結能帶結構和對短波紅外閾透射式光電陰極的影響。研究結果顯示:Schottky勢壘偏壓至少要達到8 V纔能較好消除p-InGaAs/p-InP異質結的勢壘影響。此時,為達到較小的漏電流, In0.53Ga0.47As光吸收層厚度2?m,InP髮射層厚度1?m,摻雜濃度均為1×1016 cm-3。
침대일충단파홍외역투사식광음겁,간요개소기광자흡수층화전자발사층분리식이질결결구후,결합이질결량측대홍외광자현저흡수효응삼수화대전자고효수운특성삼수진행건모,상세연구료장조전압대p-p형이질결능대결구화대단파홍외역투사식광전음겁적영향。연구결과현시:Schottky세루편압지소요체도8 V재능교호소제p-InGaAs/p-InP이질결적세루영향。차시,위체도교소적루전류, In0.53Ga0.47As광흡수층후도2?m,InP발사층후도1?m,참잡농도균위1×1016 cm-3。
One type of shortwave infrared threshold transmission field-assisted photocathode was reviewed, because of its heterojunction structure, the photon absorption layer and electron-emitting layer were separated from each other. On the basis of significant infrared photon absorption effect and high efficient carrier transmission effect, the influence of field-assisted voltage impact upon the energy band structure and the short-wave infrared threshold photocathode were modeled and simulated. This study demonstrates that the schottky barrier bias voltage at least reaches to 8 V to eliminate the effect of p-InGaAs/p-InP heterojunction barrier. And under this condition, in order to get smaller leakage current, the thickness of In0.53Ga0.47As absorption layer is 2?m, the thickness of InP electron-emitting layer is 1?m, and both dopant level are 1×1016cm-3.