CAJ | 학술논문

为控制石英玻璃与 HF 酸的反应，实现石英玻璃精密元件的化学蚀刻和对石英玻璃工艺品的精确加工，探讨了化学反应机理和腐蚀的动力学过程。重点探究了影响整个蚀刻过程的重要因素，HF 酸溶液的浓度 c、反应的温度 T 和反应的时间 t 与蚀刻深度之间的关系。结合 power law 幂率模型的原理，建立了适用于石英玻璃浅层蚀刻的数学模型。验证时，选取了10，20℃等温度下，4种不同浓度的 HF 酸体系，通过模拟曲线和实验数据的对比，得知误差基本维持在5%以内。因此，该模型可以对玻璃的浅层蚀刻进行比较准确的模拟。
위공제석영파리여 HF 산적반응，실현석영파리정밀원건적화학식각화대석영파리공예품적정학가공，탐토료화학반응궤리화부식적동역학과정。중점탐구료영향정개식각과정적중요인소，HF 산용액적농도 c、반응적온도 T 화반응적시간 t 여식각심도지간적관계。결합 power law 멱솔모형적원리，건립료괄용우석영파리천층식각적수학모형。험증시，선취료10，20℃등온도하，4충불동농도적 HF 산체계，통과모의곡선화실험수거적대비，득지오차기본유지재5%이내。인차，해모형가이대파리적천층식각진행비교준학적모의。
In order to control the reaction of HF/SiO2 system and realize an accurate fabrication of precise element and glass handiwork, the chemical reaction mechanism and kinetics were discussed. The major factors to affect the etching process were investigated, such as concentration of HF, temperature and time. Combined with power law model, a superficial chemical etching model was established to describe the etching technology. Then the model was verified at 10 ℃and 20 ℃ with four different concentrations of HF. Analog curve plotted by the mathematical model was compared with experimental data. The results show that the range of error is within 5%. So the superficial chemical etching model has the ability to carry out an accuracy simulation.