CAJ | 학술논문

研究了基于光谱式椭偏仪精确测量紫外弱吸收薄膜光学常数的可靠方法.以HfO2和SiO2薄膜为研究对象,用光谱式椭偏仪测量了薄膜的多角度椭偏参数,采用逐点优化法,建立了多层模型.利用Cauchy-Urbach模型进行数据拟合,获得了HfO2和SiO2薄膜在200～900 nm波段的光学常数,并比较双层薄膜拟合结果和扫描电镜的测量结果,验证了获得的光学常数的准确性.结果表明,逐点优化法结合Cauchy-Urbach模型能够较好地描述弱吸收薄膜的结构,较为准确地得到薄膜的色散关系,可为紫外滤光片的后期制作奠定基础.
연구료기우광보식타편의정학측량자외약흡수박막광학상수적가고방법.이HfO2화SiO2박막위연구대상,용광보식타편의측량료박막적다각도타편삼수,채용축점우화법,건립료다층모형.이용Cauchy-Urbach모형진행수거의합,획득료HfO2화SiO2박막재200～900 nm파단적광학상수,병비교쌍층박막의합결과화소묘전경적측량결과,험증료획득적광학상수적준학성.결과표명,축점우화법결합Cauchy-Urbach모형능구교호지묘술약흡수박막적결구,교위준학지득도박막적색산관계,가위자외려광편적후기제작전정기출.
A reliable and accurate method based on multilayer film model by spectroscopic ellipsometry is proposed to measure optical constants of UV weak absorption films. Take examples of HfO2 film and SiO2 film, multi-angle ellipsometry parameters Psi and Delta had been measured by spectroscopic ellipsometry to inverse optical constants of HfO2 and SiO2 film between 200 nm and 900 nm in Wavelength, which were fitted by point-by-point method using the Cauchy with urbach absorption model. Comparing the fitting result of ellipsometry and the test result of scanning electron microscopy (SEM), we verified the accuracy of the optical constants of HfO2 and SiO2 film. The results show that the structure and optical constants of weak absorption coating can be better described by Cauchy with urbach absorption model using point-by-point method, and the results are important for the fabrication of UV filters.