CAJ | 학술논문

以龙井43为材料，高温（43℃）处理48 h后，分别用调制荧光成像系统和双通道荧光仪分析其受胁迫的状态和光合系统的受损情况。结果表明，受到高温胁迫后：茶树会表现出一系列的热害症状；茶树叶片的光合速率持续下降，Rubisco最大羧化速率（Vc,max）以及RuBP的最大再生速率（Jmax）显著降低；Fv/Fm、Y(II)和Y(I)迅速降低，Y(NO)和 Y(NA)上升，说明光系统 II 和光系统 I 的结构在高温胁迫下受到了伤害；茶树的ΦPSⅡ、ETR(II)和 ETR(I)均显著下降，表明电子传递受到严重破坏；光系统 I 对高温胁迫的耐受性较高，抗强光损伤能力在高温胁迫下变强，而光系统II易受到高温伤害，抗强光损伤能力在高温胁迫下变弱。
이룡정43위재료，고온（43℃）처리48 h후，분별용조제형광성상계통화쌍통도형광의분석기수협박적상태화광합계통적수손정황。결과표명，수도고온협박후：다수회표현출일계렬적열해증상；다수협편적광합속솔지속하강，Rubisco최대최화속솔（Vc,max）이급RuBP적최대재생속솔（Jmax）현저강저；Fv/Fm、Y(II)화Y(I)신속강저，Y(NO)화 Y(NA)상승，설명광계통 II 화광계통 I 적결구재고온협박하수도료상해；다수적ΦPSⅡ、ETR(II)화 ETR(I)균현저하강，표명전자전체수도엄중파배；광계통 I 대고온협박적내수성교고，항강광손상능력재고온협박하변강，이광계통II역수도고온상해，항강광손상능력재고온협박하변약。
Abastract:To study the effects of heat stress on the photosynthesis systemofteaplant(Camellia sinensisL.), seedlings of‘Longjing 43’cultivar were challenged with high temperature (43℃) for 48 h followed by observation of photosynthetic apparatus by using Imaging Fluorescence system and Dual-PAM. Results obtainedwereas follows:Heat stress caused obvious alterations in the leaf phenotype.Net photosynthetic rate declined gradually following heat stress which was accompanied with significant decreases in the maximum carboxylation rate of Rubisco and the maximum RuBP regeneration rate.Heat stress decreased Fv/Fm, Y(I) and Y (II) rapidly, but increased Y(NO) and Y (NA), indicating thatboth photosystemIIand photosystemIwere damaged by heat stress.ΦPSⅡ,ETR(II) and ETR(I) were also decreased significantly by heat stress, suggesting that heat stress possibly blocked the electron transduction, in tea leaves, photosystemIwas more tolerant to heat stress, while photosystemIIwas relatively sensitive.