CAJ | 학술논문

用直流磁控溅射方法在玻璃基片上制备了[Ni80Fe20/Cu]20多层膜，其中采用了靶表磁场强度不同的靶腔沉积铜层，利用X射线衍射和振动样品磁强计对Cu(100nm)/[Ni80Fe20(0.9nm)/Cu(tCu)]20两个系列样品的结构和磁性进行了表征。靶表磁场较弱时沉积的多层膜具有良好的层间耦合振荡行为，而靶表磁场较强时制备的多层膜没有出现反铁磁耦合。依据上述事实，我们推测靶表磁场强度的不同会影响 NiFe/Cu 界面扩散，进而对多层膜样品的磁性产生影响。用靶表磁场较弱的靶腔沉积中间层铜能够有效减小界面互溶程度，改善镍铁与铜的成层质量。而靶表磁场较强的靶腔溅射出的铜原子具有较高能量，在界面处扩散并与镍铁层互溶，破坏了层状结构。
용직류자공천사방법재파리기편상제비료[Ni80Fe20/Cu]20다층막，기중채용료파표자장강도불동적파강침적동층，이용X사선연사화진동양품자강계대Cu(100nm)/[Ni80Fe20(0.9nm)/Cu(tCu)]20량개계렬양품적결구화자성진행료표정。파표자장교약시침적적다층막구유량호적층간우합진탕행위，이파표자장교강시제비적다층막몰유출현반철자우합。의거상술사실，아문추측파표자장강도적불동회영향 NiFe/Cu 계면확산，진이대다층막양품적자성산생영향。용파표자장교약적파강침적중간층동능구유효감소계면호용정도，개선얼철여동적성층질량。이파표자장교강적파강천사출적동원자구유교고능량，재계면처확산병여얼철층호용，파배료층상결구。
The [Ni80Fe20/Cu]20 multilayers(MLs) were deposited on glass substrates by dc magnetron sputtering, in which copper layers were prepared by target chambers with different magnetic field intensities at surface. These two series of MLs are characterized by means of X-ray diffractometer and vibrating sample magnetometer. There are fine interlayer exchange coupling oscillations in the MLs deposited by the target chamber with weak magnetic field at surface. While the MLs prepared by the target chamber with strong magnetic field at surface exhibit no antiferromagnetic coupling. According to these facts, we speculate that different magnetic field intensities at the surface of target chamber will cause difference of interface diffusion in the MLs, thus having an influence on magnetic properties. Preparation of middle copper layers with the target chamber with weak magnetic field at surface can reduce the degree of interfacial miscibility effectively and improve the quality of NiFe and Cu layers. While the sputtered Cu atoms when using the target chamber with strong magnetic field have higher energy to diffuse and mix with NiFe layers, damaging the layered structure.