金刚石与磨料磨具工程
金剛石與磨料磨具工程
금강석여마료마구공정
Diamond & Abrasives Engineering
2015年
5期
38-42,54
,共6页
电流%金刚石%电镀镍
電流%金剛石%電鍍鎳
전류%금강석%전도얼
current%diamond%nickel plating
为研究电镀电流对金刚石表面镀镍层沉积速率的影响，采用电沉积法对金刚石表面镀镍，并观察镀层的表面形貌，同时分析了电镀电流对镀镍金刚石镀镍层致密度、冲击韧性和抗压强度的影响。实验结果表明：当电镀电流从2 A 升至6 A ，随着电流增大，金刚石的镀镍层镀速、冲击韧性和抗压强度均随之增大，并在6 A 时达到最大；镀覆金刚石表面镀层均匀，且漏镀现象减少；电镀电流影响镀液温度，而镀液温度决定了镀层的致密度。电镀液温度处于50℃时，镀镍层显微应变最小，镀层的致密度达到最大。
為研究電鍍電流對金剛石錶麵鍍鎳層沉積速率的影響，採用電沉積法對金剛石錶麵鍍鎳，併觀察鍍層的錶麵形貌，同時分析瞭電鍍電流對鍍鎳金剛石鍍鎳層緻密度、遲擊韌性和抗壓彊度的影響。實驗結果錶明：噹電鍍電流從2 A 升至6 A ，隨著電流增大，金剛石的鍍鎳層鍍速、遲擊韌性和抗壓彊度均隨之增大，併在6 A 時達到最大；鍍覆金剛石錶麵鍍層均勻，且漏鍍現象減少；電鍍電流影響鍍液溫度，而鍍液溫度決定瞭鍍層的緻密度。電鍍液溫度處于50℃時，鍍鎳層顯微應變最小，鍍層的緻密度達到最大。
위연구전도전류대금강석표면도얼층침적속솔적영향，채용전침적법대금강석표면도얼，병관찰도층적표면형모，동시분석료전도전류대도얼금강석도얼층치밀도、충격인성화항압강도적영향。실험결과표명：당전도전류종2 A 승지6 A ，수착전류증대，금강석적도얼층도속、충격인성화항압강도균수지증대，병재6 A 시체도최대；도복금강석표면도층균균，차루도현상감소；전도전류영향도액온도，이도액온도결정료도층적치밀도。전도액온도처우50℃시，도얼층현미응변최소，도층적치밀도체도최대。
Electrodeposition method was used to plate the surface of diamond with nickel . The effects of electroplating current on deposition rate of nickel plating on diamond surface , nickel plating layer density and impact toughness were discussed . The surface morphology of nickel coating was observed , and the compressive strength of nickel plated diamond was also discussed . The experimental results demonstrated that when plating current rose from 2 A to 6 A , the diamond′s nickel plating rate , impact toughness and compressive strength all increased as the current rose , and reached their maximum value at current of 6 A . The diamond surface coating became more uniform and the plating leakage reduced . Electroplating current could affect the bath temperature , which determined coating density . The microscopic strain of nickel plating layer was smallest and coating density achieved its maximum when the bath temperature was 50 ℃ .
