西安文理学院学报(自然科学版)
西安文理學院學報(自然科學版)
서안문이학원학보(자연과학판)
Journal of Xi'an University of Arts and Science (Natural Science Edition)
2015年
4期
8-11
,共4页
王耀%李成山%于泽铭%冯建情%金利华%王辉%许征兵%张平祥
王耀%李成山%于澤銘%馮建情%金利華%王輝%許徵兵%張平祥
왕요%리성산%우택명%풍건정%금리화%왕휘%허정병%장평상
La2 Zr2 O7%金属有机沉积%织构%表面形貌%涂层导体%缓冲层
La2 Zr2 O7%金屬有機沉積%織構%錶麵形貌%塗層導體%緩遲層
La2 Zr2 O7%금속유궤침적%직구%표면형모%도층도체%완충층
La2 Zr2 O7%metal organic deposition%texture%surface morphology%coated conduc-tor%buffer layer
采用辊到辊方式利用金属有机沉积(MOD)技术在双轴织构的 NiW 合金基带上制备了烧绿石结构的 La2 Zr2 O7(LZO)缓冲层长带样品,利用 X 射线衍射(XRD)和原子力显微镜(AFM)对长带样品不同部位截取短样的织构和表面形貌进行了分析。结果表明,已经制得了具有良好 c 轴织构且表面光滑的 LZO 膜。然而长带样品的织构锐利度小于静态短样的织构度,可以认为,热处理过程中影响升温速率以及恒温热处理时间的走带速度是获得高质量长带缓冲层样品的关键因素。
採用輥到輥方式利用金屬有機沉積(MOD)技術在雙軸織構的 NiW 閤金基帶上製備瞭燒綠石結構的 La2 Zr2 O7(LZO)緩遲層長帶樣品,利用 X 射線衍射(XRD)和原子力顯微鏡(AFM)對長帶樣品不同部位截取短樣的織構和錶麵形貌進行瞭分析。結果錶明,已經製得瞭具有良好 c 軸織構且錶麵光滑的 LZO 膜。然而長帶樣品的織構銳利度小于靜態短樣的織構度,可以認為,熱處理過程中影響升溫速率以及恆溫熱處理時間的走帶速度是穫得高質量長帶緩遲層樣品的關鍵因素。
채용곤도곤방식이용금속유궤침적(MOD)기술재쌍축직구적 NiW 합금기대상제비료소록석결구적 La2 Zr2 O7(LZO)완충층장대양품,이용 X 사선연사(XRD)화원자력현미경(AFM)대장대양품불동부위절취단양적직구화표면형모진행료분석。결과표명,이경제득료구유량호 c 축직구차표면광활적 LZO 막。연이장대양품적직구예리도소우정태단양적직구도,가이인위,열처리과정중영향승온속솔이급항온열처리시간적주대속도시획득고질량장대완충층양품적관건인소。
In this paper, the sample of long length baseband of La2 Zr2 O7 (LZO) buffer layer with pyrochlore structure was fabricated on the NiW baseband of bi-axial texture by using of the roll to roll mode and the metal organic deposition ( MOD) technology, and X ray diffraction (XRD) and atomic force microscopy (AFM) were used to analyze the texture and surface mor-phology of the short length samples extracted from the different positions of long length baseband of buffer layer. The result indicates that the LZO film with good c axis texture and smooth sur-face is obtained. However, the texture sharpness of the long length baseband samples is less than the texture degree of the static short length sample, and we can think that in the heat treat-ment process, the walking speed of baseband that influencing the heating rate and the time of heat treatment in constant temperature is the key factor to obtain the long-length baseband buff-er layer sample with good performance.