火工品
火工品
화공품
Initiators & Pyrotechnics
2015年
4期
17-20
,共4页
钛薄膜%溅射功率%工作气压%沉积速率%电阻率%微观结构
鈦薄膜%濺射功率%工作氣壓%沉積速率%電阻率%微觀結構
태박막%천사공솔%공작기압%침적속솔%전조솔%미관결구
Ti thin film%Suttering power%Pressure%Deposition rate%Resistivity%Mcrostructure
采用直流磁控溅射镀膜技术,在硅片上以不同的工艺参数(如溅射功率、工作气压)制备钛薄膜。通过单因素试验研究了溅射功率和工作气压对钛薄膜沉积速率、电阻率的影响,并利用扫描电子显微镜观察薄膜样品截面,获得了制备低电压起爆的复合含能桥膜的最佳工艺参数。
採用直流磁控濺射鍍膜技術,在硅片上以不同的工藝參數(如濺射功率、工作氣壓)製備鈦薄膜。通過單因素試驗研究瞭濺射功率和工作氣壓對鈦薄膜沉積速率、電阻率的影響,併利用掃描電子顯微鏡觀察薄膜樣品截麵,穫得瞭製備低電壓起爆的複閤含能橋膜的最佳工藝參數。
채용직류자공천사도막기술,재규편상이불동적공예삼수(여천사공솔、공작기압)제비태박막。통과단인소시험연구료천사공솔화공작기압대태박막침적속솔、전조솔적영향,병이용소묘전자현미경관찰박막양품절면,획득료제비저전압기폭적복합함능교막적최가공예삼수。
Based on magnetron sputtering deposition technology, Ti thin films were deposited on Si substrate by different technological parameters (such as sputtering power, pressure). The influences of sputtering power and pressure on the deposition rate and the resistivity of Ti thin films were researched, by the sputtering power and pressure single factor tests. The cross section of the thin film samples was observed by SEM, as well as the best technological parameters for preparing energetic thin film, which can be initiated by low voltage, were obtained.