工业用水与废水
工業用水與廢水
공업용수여폐수
Industrial Water & Wastewater
2015年
5期
33-36
,共4页
韩利华%郑虹杏%刘秋艳%赵由春%陈春江%王家喜
韓利華%鄭虹杏%劉鞦豔%趙由春%陳春江%王傢喜
한리화%정홍행%류추염%조유춘%진춘강%왕가희
有机硅废水%Fenton试剂%CODCr%正交试验
有機硅廢水%Fenton試劑%CODCr%正交試驗
유궤규폐수%Fenton시제%CODCr%정교시험
organic silicon wastewater%Fenton reagent%CODCr%orthogonal test
采用Fenton氧化法处理有机硅工业废水。通过正交试验和单因素试验,考察了反应时间、 n(H2O2)/n(Fe2+)、温度、 pH值和H2O2投加量等因素对废水CODCr去除率的影响。结果表明, Fenton氧化法的影响因素主次为: H2O2投加量、 pH值、温度、 n(H2O2)/n(Fe2+)、反应时间;在pH值为3、 n(H2O2)/n(Fe2+)值为6、反应时间为60 min、温度为35℃的最佳条件下,对于CODCr的质量浓度为5440 mg/L的有机硅废水,在100 mL的水样中投加14 mL H2O2(30%),可使CODCr的去除率达到90.92%。
採用Fenton氧化法處理有機硅工業廢水。通過正交試驗和單因素試驗,攷察瞭反應時間、 n(H2O2)/n(Fe2+)、溫度、 pH值和H2O2投加量等因素對廢水CODCr去除率的影響。結果錶明, Fenton氧化法的影響因素主次為: H2O2投加量、 pH值、溫度、 n(H2O2)/n(Fe2+)、反應時間;在pH值為3、 n(H2O2)/n(Fe2+)值為6、反應時間為60 min、溫度為35℃的最佳條件下,對于CODCr的質量濃度為5440 mg/L的有機硅廢水,在100 mL的水樣中投加14 mL H2O2(30%),可使CODCr的去除率達到90.92%。
채용Fenton양화법처리유궤규공업폐수。통과정교시험화단인소시험,고찰료반응시간、 n(H2O2)/n(Fe2+)、온도、 pH치화H2O2투가량등인소대폐수CODCr거제솔적영향。결과표명, Fenton양화법적영향인소주차위: H2O2투가량、 pH치、온도、 n(H2O2)/n(Fe2+)、반응시간;재pH치위3、 n(H2O2)/n(Fe2+)치위6、반응시간위60 min、온도위35℃적최가조건하,대우CODCr적질량농도위5440 mg/L적유궤규폐수,재100 mL적수양중투가14 mL H2O2(30%),가사CODCr적거제솔체도90.92%。
Fenton oxidation process was used to treat organic silicon industrial wastewater. Through the or-thogonal test and single factor test, the influence of reaction time, n (H2O2) : n (Fe2+), temperature, pH value, H2O2 dosage and some other factors on CODCr removal were investigated. The test results showed that, the effect of the influencing factors of Fenton oxidation process followed the decreasing order of H2O2 dosage, pH value, temperature, ratio of n(H2O2) :n(Fe2+), and reaction time. Under the optimal condition that the mass concentra-tion of CODCr was 5 440 mg/L, the ratio of n(H2O2) :n(Fe2+) was 6: 1, the reaction time was 60 min, the tem-perature was 35℃, dosing 14 mL of H2O2(30%) into the organic silicon wastewater sample with mass concentra-tion of CODCr of 5 440 mg/L, the removal rate of CODCr could reach 90.92%.