长春工业大学学报(自然科学版)
長春工業大學學報(自然科學版)
장춘공업대학학보(자연과학판)
Journal of Changchun University of Technology(Natural Science Edition)
2015年
4期
390-394
,共5页
硅中阶梯光栅%湿法刻蚀%衍射效率
硅中階梯光柵%濕法刻蝕%衍射效率
규중계제광책%습법각식%연사효솔
silicon echelle grating%wet etching%diffraction efficiency
建立了单晶硅中阶梯光栅湿法刻蚀全工艺过程 ,并对该工艺所涉及的光刻胶掩模制备、氧化层掩膜制备以及单晶硅湿法刻蚀等环节进行了研究.利用该工艺制作了口径为20 mm × 20 mm的中阶梯光栅 ,其在入射波长532 nm ,Littrow 方式入射时 ,-42级衍射效率大于70% .
建立瞭單晶硅中階梯光柵濕法刻蝕全工藝過程 ,併對該工藝所涉及的光刻膠掩模製備、氧化層掩膜製備以及單晶硅濕法刻蝕等環節進行瞭研究.利用該工藝製作瞭口徑為20 mm × 20 mm的中階梯光柵 ,其在入射波長532 nm ,Littrow 方式入射時 ,-42級衍射效率大于70% .
건립료단정규중계제광책습법각식전공예과정 ,병대해공예소섭급적광각효엄모제비、양화층엄막제비이급단정규습법각식등배절진행료연구.이용해공예제작료구경위20 mm × 20 mm적중계제광책 ,기재입사파장532 nm ,Littrow 방식입사시 ,-42급연사효솔대우70% .
A wet etching process for silicon echelle grating is established ,ant the techniques such as preparation of photosensitive mask ,oxide layer and etching process are studied .With the techniques , a middle-stage grating with diameter 20 × 20 mm2 is made .The maximum diffraction efficiency is up to 70% when incident wavelength is 532 nm and the incident way is Littrow (the blaze angle α=64°) .