CAJ | 학술논문

研究了一种基于聚焦离子束( FIB)刻蚀法制备软刻蚀用母模板的新方法. 该方法采用FIB刻蚀技术在Si基底上制备出15 μm ×15 μm的轮廓清晰的三维结构作为弹性印章的母模板,三甲基氯硅烷( TMCS)作为抗黏连层旋涂于Si基底表面,其后旋涂聚二甲基硅氧烷( PDMS)预聚物复制模铸出与Si基底相反的微三维结构. 通过接触角测量仪检测Si样品表面疏水性能,并用原子力显微镜( AFM)对PDMS样品形貌进行检测. 研究结果表明,特征图形得到了很好的转移. 该方法相对于传统软刻蚀母模板制备方法,加工的三维结构具有操作步骤简单、制备周期短的特点,是一种有效的制备软刻蚀母模板方法.
연구료일충기우취초리자속( FIB)각식법제비연각식용모모판적신방법. 해방법채용FIB각식기술재Si기저상제비출15 μm ×15 μm적륜곽청석적삼유결구작위탄성인장적모모판,삼갑기록규완( TMCS)작위항점련층선도우Si기저표면,기후선도취이갑기규양완( PDMS)예취물복제모주출여Si기저상반적미삼유결구. 통과접촉각측량의검측Si양품표면소수성능,병용원자력현미경( AFM)대PDMS양품형모진행검측. 연구결과표명,특정도형득도료흔호적전이. 해방법상대우전통연각식모모판제비방법,가공적삼유결구구유조작보취간단、제비주기단적특점,시일충유효적제비연각식모모판방법.
In this research , we used a new method based on focused ion beam ( FIB) etching to fabricate master mold for soft lithography .Three-dimensional structures with an area of 15μm ×15μm as the mas-ter of elastic stamps were successfully fabricated on the silicon substrate by FIB etching .Trimethyl chlorosi-lane ( TMCS) as an anti-adhesion layer was spin coated on the silicon substrate , and polydimethylsiloxane ( PDMS) prepolymer was spin coated on the TMCS and then replicated the adverse of the micro three -di-mensional structures of Si specimen .The surface hydrophobic performance of Si specimen was tested by the contact angel measurement instrument and the morphology of PDMS sample surface was tested by atomic force microscope ( AFM) .The results show that the feature structures were transferred effectively .Com-pared with other traditional methods , the operating procedure of the method was simpler and shorter prepa-ration period ,it was an effective method of preparation of master mold for soft lithography .