表面技术
錶麵技術
표면기술
Surface Technology
2015年
11期
29-34
,共6页
陈昌浩%金永中%刘东亮%余学金
陳昌浩%金永中%劉東亮%餘學金
진창호%금영중%류동량%여학금
多弧离子镀%TiN涂层%负偏压%ImageJ软件%大颗粒%像素分布
多弧離子鍍%TiN塗層%負偏壓%ImageJ軟件%大顆粒%像素分佈
다호리자도%TiN도층%부편압%ImageJ연건%대과립%상소분포
multi-arc ion plating%TiN coatings%negative bias voltage%ImageJ software%microparticles%pixel distribution
目的 分析不同负偏压下TiN涂层表面的大颗粒数量、尺寸和面积以及像素分布,为多弧离子镀技术的工业化应用提供基础数据. 方法 采用多弧离子镀膜技术,以脉冲负偏压为变量,在硬质合金表面沉积TiN涂层. 用扫描电子显微镜对涂层表面形貌进行表征,并利用ImageJ软件对表面大颗粒的数量和尺寸进行分析,对像素分布进行统计. 结果 随着负偏压的增加,涂层表面大颗粒的数量先增多,后减少. 负偏压为100 V时,大颗粒数量最多,为1364;负偏压为300 V时,大颗粒数量最少,为750. 此外随着负偏压的增加,大颗粒所占涂层面积比逐渐减小. 未加负偏压时,涂层表面大颗粒所占面积比最大,为6 . 9%,且此时涂层的力学性能最差;采用400 V负偏压时,涂层表面大颗粒所占面积比最小,为3 . 3%,且此时涂层的力学性能最好. 负偏压为300 V时,亮、暗像素点的个数最多,为8302;负偏压为400 V时,亮、暗像素点的个数最少,为4067. 结论 当占空比为30%,沉积时间为1 h,负偏压为400 V时,获得的涂层力学性能最好,颗粒数量少且尺寸小.
目的 分析不同負偏壓下TiN塗層錶麵的大顆粒數量、呎吋和麵積以及像素分佈,為多弧離子鍍技術的工業化應用提供基礎數據. 方法 採用多弧離子鍍膜技術,以脈遲負偏壓為變量,在硬質閤金錶麵沉積TiN塗層. 用掃描電子顯微鏡對塗層錶麵形貌進行錶徵,併利用ImageJ軟件對錶麵大顆粒的數量和呎吋進行分析,對像素分佈進行統計. 結果 隨著負偏壓的增加,塗層錶麵大顆粒的數量先增多,後減少. 負偏壓為100 V時,大顆粒數量最多,為1364;負偏壓為300 V時,大顆粒數量最少,為750. 此外隨著負偏壓的增加,大顆粒所佔塗層麵積比逐漸減小. 未加負偏壓時,塗層錶麵大顆粒所佔麵積比最大,為6 . 9%,且此時塗層的力學性能最差;採用400 V負偏壓時,塗層錶麵大顆粒所佔麵積比最小,為3 . 3%,且此時塗層的力學性能最好. 負偏壓為300 V時,亮、暗像素點的箇數最多,為8302;負偏壓為400 V時,亮、暗像素點的箇數最少,為4067. 結論 噹佔空比為30%,沉積時間為1 h,負偏壓為400 V時,穫得的塗層力學性能最好,顆粒數量少且呎吋小.
목적 분석불동부편압하TiN도층표면적대과립수량、척촌화면적이급상소분포,위다호리자도기술적공업화응용제공기출수거. 방법 채용다호리자도막기술,이맥충부편압위변량,재경질합금표면침적TiN도층. 용소묘전자현미경대도층표면형모진행표정,병이용ImageJ연건대표면대과립적수량화척촌진행분석,대상소분포진행통계. 결과 수착부편압적증가,도층표면대과립적수량선증다,후감소. 부편압위100 V시,대과립수량최다,위1364;부편압위300 V시,대과립수량최소,위750. 차외수착부편압적증가,대과립소점도층면적비축점감소. 미가부편압시,도층표면대과립소점면적비최대,위6 . 9%,차차시도층적역학성능최차;채용400 V부편압시,도층표면대과립소점면적비최소,위3 . 3%,차차시도층적역학성능최호. 부편압위300 V시,량、암상소점적개수최다,위8302;부편압위400 V시,량、암상소점적개수최소,위4067. 결론 당점공비위30%,침적시간위1 h,부편압위400 V시,획득적도층역학성능최호,과립수량소차척촌소.
Objective To analyze the microparticles ( MPs) morphology and pixel distribution of TiN coatings under different negative bias voltage (0, 100, 200, 300 and 400V), so as to provide basic data for industrial applications of multi-arc ion plating. Methods TiN coatings were deposited on hard alloy surface by multi-arc ion plating at different bias voltage. The surface morpholo- gy of TiN coatings was characterized by scanning electron microscope ( SEM) . At the same time, the amount and size of MPs were analyzed and the distribution of pixel was counted by ImageJ software. Results The amount of MPs on coating surface increased at first and then decreased with the increase of bias voltage. The maximum value was 1364 at 100 V and the minimum was 750 at 300 V. In addition, the area ratio of MPs on coating surface decreased gradually with the increase of bias voltage. The maximum value with worst mechanical properties was 6. 9% at 0 V and the minimum with best mechanical properties was 3. 3% at 400 V. The amount of light and dark pixel reached a maximum of 8302 at 300 V and a minimum of 4067 at 400 V. Conclusion The TiN coa-tings with best mechanical properties, low amount and small size of MPs were deposited at 400 V for 1 h with 30% duty cycle.
