表面技术
錶麵技術
표면기술
Surface Technology
2015年
11期
1-6,28
,共7页
宋沂泽%高原%董中新%张焱%彭凯%王成磊
宋沂澤%高原%董中新%張焱%彭凱%王成磊
송기택%고원%동중신%장염%팽개%왕성뢰
多弧离子镀%氮化钛%负偏压%耐磨性%结合力%硬度
多弧離子鍍%氮化鈦%負偏壓%耐磨性%結閤力%硬度
다호리자도%담화태%부편압%내마성%결합력%경도
MAIP%TiN%negative bias voltage%wear resistance%fording force%hardness
目的 确定适当的负偏压,提高多弧离子镀氮化钛薄膜的综合性能. 方法 采用不同的负偏压,在4 Cr13不锈钢表面制备TiN薄膜,探讨偏压对薄膜表面质量、结构、硬度、结合力和摩擦系数的影响. 结果 负偏压对薄膜表面质量的影响较大:负偏压为0 V时,TiN薄膜表面凹凸不平,液滴较多;随着负偏压升高,薄膜表面变得光滑,液滴减少并变小,薄膜致密性也得到提高. 在不同负偏压下, TiN薄膜均呈现出在(111)晶面的择优取向,但随着负偏压的增大,这种择优取向逐渐减弱,当负偏压达到400 V时,薄膜在(220)晶面的峰值逐渐增强. 随着负偏压从0增至400 V,薄膜的硬度、结合力和耐磨性均先提高,后降低. 当负偏压为300 V时,薄膜的硬度和结合力达到最大,分别为2650 HV和58 N;摩擦系数和磨损量最小,分别为0. 48和0. 1065 mm3. 结论 施加适当的负偏压可以提高薄膜的硬度、结合力、耐磨性等性能,当负偏压为300 V时,薄膜的各项性能达到最佳.
目的 確定適噹的負偏壓,提高多弧離子鍍氮化鈦薄膜的綜閤性能. 方法 採用不同的負偏壓,在4 Cr13不鏽鋼錶麵製備TiN薄膜,探討偏壓對薄膜錶麵質量、結構、硬度、結閤力和摩抆繫數的影響. 結果 負偏壓對薄膜錶麵質量的影響較大:負偏壓為0 V時,TiN薄膜錶麵凹凸不平,液滴較多;隨著負偏壓升高,薄膜錶麵變得光滑,液滴減少併變小,薄膜緻密性也得到提高. 在不同負偏壓下, TiN薄膜均呈現齣在(111)晶麵的擇優取嚮,但隨著負偏壓的增大,這種擇優取嚮逐漸減弱,噹負偏壓達到400 V時,薄膜在(220)晶麵的峰值逐漸增彊. 隨著負偏壓從0增至400 V,薄膜的硬度、結閤力和耐磨性均先提高,後降低. 噹負偏壓為300 V時,薄膜的硬度和結閤力達到最大,分彆為2650 HV和58 N;摩抆繫數和磨損量最小,分彆為0. 48和0. 1065 mm3. 結論 施加適噹的負偏壓可以提高薄膜的硬度、結閤力、耐磨性等性能,噹負偏壓為300 V時,薄膜的各項性能達到最佳.
목적 학정괄당적부편압,제고다호리자도담화태박막적종합성능. 방법 채용불동적부편압,재4 Cr13불수강표면제비TiN박막,탐토편압대박막표면질량、결구、경도、결합력화마찰계수적영향. 결과 부편압대박막표면질량적영향교대:부편압위0 V시,TiN박막표면요철불평,액적교다;수착부편압승고,박막표면변득광활,액적감소병변소,박막치밀성야득도제고. 재불동부편압하, TiN박막균정현출재(111)정면적택우취향,단수착부편압적증대,저충택우취향축점감약,당부편압체도400 V시,박막재(220)정면적봉치축점증강. 수착부편압종0증지400 V,박막적경도、결합력화내마성균선제고,후강저. 당부편압위300 V시,박막적경도화결합력체도최대,분별위2650 HV화58 N;마찰계수화마손량최소,분별위0. 48화0. 1065 mm3. 결론 시가괄당적부편압가이제고박막적경도、결합력、내마성등성능,당부편압위300 V시,박막적각항성능체도최가.
Objective In order to improve the comprehensive performance of TiN coatings, the appropriate negative bias was in-vestigated. Methods TiN coatings were deposited with different negative bias voltage on the surface of 4Cr13 stainless steel, and the effect of negative bias voltage on the surface quality, microstructure, hardness, binding force and friction coefficient of the coa-tings was investigated. Results The results showed that negative bias voltage had an obvious influence on the surface quality of the TiN coating. When the negative bias voltage was 0 V, there were many droplets, larger particles and a few pits. With the increase of the bias voltage, the number and size of droplets on the film surface were reduced, and the coatings surface became smooth and more compact. TiN films deposited at different bias voltage all showed preferred orientation in (111) crystal plane, but with the increase of bias voltage, the preferred orientation gradually diminished, when the bias voltage was 400 V, the peak value of the film on the (220) crystal plane was gradually strengthened. When the bias voltage changed between 0 V and 400 V, the hardness, fording force and abrasion resistance of coatings first increased and then decreased. When the bias voltage was 300 V, the biggest hardness and fording force reached 2650HV and 58 N, respectively;The friction coefficient and abrasion loss were 0. 48 and 0. 1065 mm3 , respec-tively. Conclusion Applying proper negative bias voltage could improve the comprehensive properties of coatings, such as hardness, fording force and abrasion resistance. When the bias voltage was 300 V, the TiN film deposited showed the best properties.
